发明申请
- 专利标题: APPARATUS FOR PRODUCING SINGLE CRYSTAL SILICON
- 专利标题(中): 生产单晶硅的装置
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申请号: US12343798申请日: 2008-12-24
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公开(公告)号: US20090158996A1公开(公告)日: 2009-06-25
- 发明人: Noboru Chikusa , Teruhisa Kitagawa , Masaki Ito , Takanori Ito
- 申请人: Noboru Chikusa , Teruhisa Kitagawa , Masaki Ito , Takanori Ito
- 申请人地址: JP Tokyo
- 专利权人: MITSUBISHI MATERIALS CORPORATION
- 当前专利权人: MITSUBISHI MATERIALS CORPORATION
- 当前专利权人地址: JP Tokyo
- 优先权: JP2007-331548 20071225
- 主分类号: C30B15/14
- IPC分类号: C30B15/14
摘要:
An apparatus for producing single crystal silicon comprising: an induction heating coil that is disposed around the polycrystalline silicon rod for fusing the polycrystalline silicon rod; an exothermic ring that has a quartz-coated member covering the conductive member; a support member that supports the exothermic ring and passes through a wall of the housing in a rotatable manner; an operating device that rotates the support member and reciprocates the exothermic ring between a heating position where the exothermic ring is positioned close to the induction heating coil and a stand-by position where the exothermic ring is receded from the heating position; a sealing member that is provided between the wall of the housing and the support member and maintains the hermitic therebetween; and a cooling flow path that is formed in the support member and flows a cooling medium.
公开/授权文献
- US08313577B2 Apparatus for producing single crystal silicon 公开/授权日:2012-11-20
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