发明申请
- 专利标题: PIXEL STRUCTURE AND MANUFACTURING METHOD THEREOF
- 专利标题(中): 像素结构及其制造方法
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申请号: US12177882申请日: 2008-07-23
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公开(公告)号: US20090166634A1公开(公告)日: 2009-07-02
- 发明人: Hsiang-Lin Lin , Chun-Chieh Tsao
- 申请人: Hsiang-Lin Lin , Chun-Chieh Tsao
- 申请人地址: TW Hsinchu
- 专利权人: AU OPTRONICS CORPORATION
- 当前专利权人: AU OPTRONICS CORPORATION
- 当前专利权人地址: TW Hsinchu
- 优先权: TW96150582 20071227
- 主分类号: H01L29/04
- IPC分类号: H01L29/04 ; H01L21/336
摘要:
A pixel structure including a gate, a gate dielectric layer, a patterned semiconductor layer having a channel area disposed above the gate, a patterned dielectric layer having an etching-stop layer disposed above the gate and a number of bumps, a patterned metal layer having a reflective pixel electrode, a source and a drain, an overcoat dielectric layer, and a transparent pixel electrode sequentially disposed on a substrate is provided. The source and the drain respectively cover portions of the channel area. The reflective pixel electrode connects the drain and covers the bumps to form an uneven surface. The overcoat dielectric layer disposed on a transistor constituted by the gate, the gate dielectric layer, the patterned semiconductor layer, the source and the drain has a contact opening exposing a portion of the reflective pixel electrode. The transparent pixel electrode is electrically connected to the reflective pixel electrode through the contact opening.
公开/授权文献
- US07713797B2 Pixel structure and manufacturing method thereof 公开/授权日:2010-05-11
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