发明申请
- 专利标题: IMPRINT APPARATUS AND METHOD FOR FINE STRUCTURE LITHOGRAPHY
- 专利标题(中): 用于精细结构光刻的印刷装置和方法
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申请号: US12343550申请日: 2008-12-24
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公开(公告)号: US20090166914A1公开(公告)日: 2009-07-02
- 发明人: Masahiko Ogino , Mitsuru Hasegawa , Akihiro Miyauchi
- 申请人: Masahiko Ogino , Mitsuru Hasegawa , Akihiro Miyauchi
- 专利权人: Hitachi Industrial Equipment Systems, Co., Ltd.
- 当前专利权人: Hitachi Industrial Equipment Systems, Co., Ltd.
- 优先权: JP2007-335513 20071227
- 主分类号: B29C59/04
- IPC分类号: B29C59/04
摘要:
An imprint apparatus for forming fine structure lithography comprises: a belt-like mold having a fine structure for imprint lithography formed on a surface of the belt-like mold; a cylindrical pressurizing mechanism including a pair of opposed rolls for pressurizing the belt-like mold against the surface of the imprinting object; and a supporting member for supporting the imprinting object at a position between the rolls of the cylindrical pressurizing mechanism. The belt-like mold, the imprinting object and the supporting member are configured to move to the cylindrical pressurizing mechanism in a mutually non-contact state, and then at the position between the rolls, be pressurized by the cylindrical pressurizing mechanism in a state where the imprinting object is positioned between the belt-like mold and the supporting member.
公开/授权文献
- US08147234B2 Imprint apparatus and method for fine structure lithography 公开/授权日:2012-04-03
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