PATTERN TRANSFER APPARATUS AND PATTERN TRANSFER METHOD
    3.
    发明申请
    PATTERN TRANSFER APPARATUS AND PATTERN TRANSFER METHOD 审中-公开
    图案转印装置和图案转印方法

    公开(公告)号:US20120256353A1

    公开(公告)日:2012-10-11

    申请号:US13414959

    申请日:2012-03-08

    摘要: A pattern transfer apparatus for pressing a mold having a fine concave/convex pattern onto a transferred material, peeling off the mold from the transferred material, and transferring the concave/convex pattern onto a surface of the transferred material includes: a pretreatment mechanism configured to perform a predetermined surface treatment to at least one of the mold and the transferred material before the concave/convex pattern is transferred; an information recording mechanism configured to record information of the surface treatment performed by the pretreatment mechanism at a position associated with an area of the transferred material where the concave/convex pattern is transferred onto the area; an interpretation mechanism configured to read the recorded information; and an after-treatment mechanism configured to perform a predetermined after-treatment to the area where the concave/convex pattern is transferred, based on the information interpreted by the interpretation mechanism.

    摘要翻译: 一种图案转印装置,用于将具有精细凹凸图案的模具压印到转印材料上,从转印材料上剥离模具,并将凹凸图案转印到转印材料的表面上,包括:预处理机构,被配置为 在传递凹凸图案之前,对模具和转印材料中的至少一个进行预定的表面处理; 信息记录机构,被配置为将所述预处理机构执行的表面处理的信息记录在与将所述凹凸图案转印到所述区域上的被转印材料的区域相关联的位置处; 解释机构,被配置为读取所记录的信息; 以及后处理机构,其被配置为基于由所述解释机构解释的信息对所述凹凸图案被传送的区域进行预定的后处理。

    IMPRINT APPARATUS AND METHOD FOR FINE STRUCTURE LITHOGRAPHY
    4.
    发明申请
    IMPRINT APPARATUS AND METHOD FOR FINE STRUCTURE LITHOGRAPHY 有权
    用于精细结构光刻的印刷装置和方法

    公开(公告)号:US20090166914A1

    公开(公告)日:2009-07-02

    申请号:US12343550

    申请日:2008-12-24

    IPC分类号: B29C59/04

    摘要: An imprint apparatus for forming fine structure lithography comprises: a belt-like mold having a fine structure for imprint lithography formed on a surface of the belt-like mold; a cylindrical pressurizing mechanism including a pair of opposed rolls for pressurizing the belt-like mold against the surface of the imprinting object; and a supporting member for supporting the imprinting object at a position between the rolls of the cylindrical pressurizing mechanism. The belt-like mold, the imprinting object and the supporting member are configured to move to the cylindrical pressurizing mechanism in a mutually non-contact state, and then at the position between the rolls, be pressurized by the cylindrical pressurizing mechanism in a state where the imprinting object is positioned between the belt-like mold and the supporting member.

    摘要翻译: 用于形成精细结构光刻的压印装置包括:在带状模具的表面上形成具有用于压印光刻的精细结构的带状模具; 圆柱形加压机构,包括一对相对的辊,用于将带状模具压靠在压印对象的表面上; 以及用于将压印对象支撑在圆筒形加压机构的辊之间的位置处的支撑构件。 带状模具,压印对象物和支撑构件被构造成在相互非接触状态下移动到圆柱形加压机构,然后在辊之间的位置被圆柱形加压机构加压, 压印对象位于带状模具和支撑构件之间。

    Imprint apparatus and method for fine structure lithography
    7.
    发明授权
    Imprint apparatus and method for fine structure lithography 有权
    用于精细结构光刻的印刷装置和方法

    公开(公告)号:US08147234B2

    公开(公告)日:2012-04-03

    申请号:US12343550

    申请日:2008-12-24

    IPC分类号: B29C59/04

    摘要: An imprint apparatus for forming fine structure lithography comprises: a belt-like mold having a fine structure for imprint lithography formed on a surface of the belt-like mold; a cylindrical pressurizing mechanism including a pair of opposed rolls for pressurizing the belt-like mold against the surface of the imprinting object; and a supporting member for supporting the imprinting object at a position between the rolls of the cylindrical pressurizing mechanism. The belt-like mold, the imprinting object and the supporting member are configured to move to the cylindrical pressurizing mechanism in a mutually non-contact state, and then at the position between the rolls, be pressurized by the cylindrical pressurizing mechanism in a state where the imprinting object is positioned between the belt-like mold and the supporting member.

    摘要翻译: 用于形成精细结构光刻的压印装置包括:在带状模具的表面上形成具有用于压印光刻的精细结构的带状模具; 圆柱形加压机构,包括一对相对的辊,用于将带状模具压靠在压印对象的表面上; 以及用于将压印对象支撑在圆筒形加压机构的辊之间的位置处的支撑构件。 带状模具,压印对象物和支撑构件被构造成在相互非接触状态下移动到圆柱形加压机构,然后在辊之间的位置被圆柱形加压机构加压, 压印对象位于带状模具和支撑构件之间。

    DEVICE AND METHOD FOR TRANSFERRING MICRO STRUCTURE
    9.
    发明申请
    DEVICE AND METHOD FOR TRANSFERRING MICRO STRUCTURE 失效
    用于传输微结构的装置和方法

    公开(公告)号:US20120205838A1

    公开(公告)日:2012-08-16

    申请号:US13370413

    申请日:2012-02-10

    IPC分类号: B29C59/16

    摘要: A microstructure transferring device is characterized in that the device comprises a stamper made from a first photo-curable resin composition cured with light with a first wavelength, and a light source emitting light with a second wavelength longer than the first wavelength. The microstructure is transferred to an impression receptor supplied with a second photo-curable resin composition, which is curable with light with the second wavelength emitted by the light source.

    摘要翻译: 微结构转印装置的特征在于,该装置包括由用第一波长的光固化的第一光固化树脂组合物制成的压模和发射长于第一波长的第二波长的光的光源。 将微结构转移到提供有第二光固化树脂组合物的印模受体中,该第二光固化树脂组合物可用由光源发出的第二波长的光固化。

    Imprinting stamper and method of manufacturing the same
    10.
    发明授权
    Imprinting stamper and method of manufacturing the same 有权
    印刷压模及其制造方法

    公开(公告)号:US08109752B2

    公开(公告)日:2012-02-07

    申请号:US12146489

    申请日:2008-06-26

    IPC分类号: B29C59/00

    摘要: An imprinting stamper which can transfer a microscopic pattern to a medium bearing a convex area or local projection, with high accuracy. A convexo-concave pattern is formed on a surface of the imprinting stamper. It includes a pattern layer having the convexo-concave pattern; and a stamper backside layer arranged on a backside of the pattern layer. Young's modulus of the pattern layer is 500 MPa to 10 GPa; and Young's modulus of the stamper backside layer is smaller than Young's modulus of the pattern layer.

    摘要翻译: 一种能够以高精度将微观图案转印到具有凸区域或局部投影的介质的压印模。 在印模压模的表面上形成凹凸图案。 它包括具有凹凸图案的图案层; 以及设置在图案层的背面上的压模背面层。 图案层的杨氏模量为500MPa至10GPa; 并且压模背面层的杨氏模量小于图案层的杨氏模量。