发明申请
US20090170992A1 ETCH RESISTANT POLYMER COMPOSITION 审中-公开
耐蚀聚合物组合物

ETCH RESISTANT POLYMER COMPOSITION
摘要:
A composite material includes a polymer and a colloidal metal oxide. The composite material has a Plasma Etch Index of 40 relative to a polymer absent the colloidal metal oxide.
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