发明申请
- 专利标题： METHOD FOR FORMING FILM PATTERN
- 专利标题（中）： 形成薄膜图案的方法
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申请号： US12351127申请日： 2009-01-09
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公开(公告)号： US20090181331A1公开(公告)日： 2009-07-16
- 发明人: Shosei Mori , Masahiro Terada
- 申请人： Shosei Mori , Masahiro Terada
- 申请人地址： JP Tokyo
- 专利权人： CANON KABUSHIKI KAISHA
- 当前专利权人： CANON KABUSHIKI KAISHA
- 当前专利权人地址： JP Tokyo
- 优先权： JP2008-004390 20080111
- 主分类号： G03F7/20
- IPC分类号： G03F7/20
摘要：
A method for forming a film pattern includes applying a water-soluble photosensitive resin on a substrate, exposing the photosensitive resin to light, developing the photosensitive resin with a developer, after developing the photosensitive resin, depositing a material for the film pattern on the substrate, and, after depositing the material for the film pattern, removing photosensitive resin remaining on the substrate with a remover. The remover and the developer include the same solute, and a concentration of the solute in the remover is higher than that in the developer.
公开/授权文献
- US08153356B2 Method for forming film pattern 公开/授权日：2012-04-10