发明申请
US20090184308A1 Forming an Intermediate Electrode Between an Ovonic Threshold Switch and a Chalcogenide Memory Element 有权
在波形阈值开关和硫族化物记忆元件之间形成中间电极

  • 专利标题: Forming an Intermediate Electrode Between an Ovonic Threshold Switch and a Chalcogenide Memory Element
  • 专利标题(中): 在波形阈值开关和硫族化物记忆元件之间形成中间电极
  • 申请号: US12414739
    申请日: 2009-03-31
  • 公开(公告)号: US20090184308A1
    公开(公告)日: 2009-07-23
  • 发明人: John M. Peters
  • 申请人: John M. Peters
  • 主分类号: H01L45/00
  • IPC分类号: H01L45/00
Forming an Intermediate Electrode Between an Ovonic Threshold Switch and a Chalcogenide Memory Element
摘要:
An intermediate electrode between an ovonic threshold switch and a memory element may be formed in the same pore with the memory element. This may have many advantages including, in some embodiments, reducing leakage.
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