发明申请
- 专利标题: ELECTRON BEAM APPARATUS
- 专利标题(中): 电子束设备
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申请号: US11996701申请日: 2006-07-24
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公开(公告)号: US20090218506A1公开(公告)日: 2009-09-03
- 发明人: Mamoru Nakasuji , Takeshi Murakami , Tohru Satake , Tsutomu Karimata , Toshifumi Kimba , Matsutaro Miyamoto , Hiroshi Sobukawa , Satoshi Mori
- 申请人: Mamoru Nakasuji , Takeshi Murakami , Tohru Satake , Tsutomu Karimata , Toshifumi Kimba , Matsutaro Miyamoto , Hiroshi Sobukawa , Satoshi Mori
- 申请人地址: JP Tokyo
- 专利权人: EBARA CORPORATION
- 当前专利权人: EBARA CORPORATION
- 当前专利权人地址: JP Tokyo
- 优先权: JP2005-215234 20050726; JP2005-272181 20050920; JP2005-329825 20051115
- 国际申请: PCT/JP2006/314571 WO 20060724
- 主分类号: H01J1/50
- IPC分类号: H01J1/50 ; A61N5/00 ; H01J3/14
摘要:
An electron beam emitted from an electron gun (G) forms a reduced image on a sample (S) through a non-dispersion Wien-filter (5-1), an electromagnetic deflector (11-1), a beam separator (12-1), and a tablet lens (17-1) as an objective lens. The beam separator (12-1) is configured such that a distance by which a secondary electron beam passes through the beam separator is approximately three times longer than a distance by which a primary electron beam passes through the beam separator. Therefore, even if a magnetic field in the beam separator is set to deflect the primary electron beam by a small angle equal to or less than approximately 10 degrees, the secondary electron beam can be deflected by approximately 30 degrees, so that the primary and secondary electron beams are sufficiently separated. Also, since the primary electron beam is deflected by a small angle, less aberration occurs in the primary electron beam. Accordingly, since a light path length of a primary electro-optical system, it is possible to reduce the influence of space charge and the occurrence of deflection aberration.
公开/授权文献
- US08067732B2 Electron beam apparatus 公开/授权日:2011-11-29
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