发明申请
- 专利标题: METHOD FOR FORMING AMORPHOUS CARBON FILM
- 专利标题(中): 形成不规则碳膜的方法
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申请号: US12396621申请日: 2009-03-03
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公开(公告)号: US20090246407A1公开(公告)日: 2009-10-01
- 发明人: Takao Saito , Tatsuya Terazawa
- 申请人: Takao Saito , Tatsuya Terazawa
- 申请人地址: JP Nagoya-City
- 专利权人: NGK Insulators, Ltd.
- 当前专利权人: NGK Insulators, Ltd.
- 当前专利权人地址: JP Nagoya-City
- 优先权: JP2008-083520 20080327
- 主分类号: B01J19/08
- IPC分类号: B01J19/08
摘要:
An amorphous carbon film forming apparatus includes a supporting electrode that is connected to ground and supports a substrate, a counter electrode that is disposed so as to face the supporting electrode and has a mixed-gas injection orifice, a chamber containing the supporting electrode and the counter electrode, and a DC pulse generator having a pulse source that applies a DC pulse voltage between the supporting electrode and the counter electrode. An amorphous carbon film is formed by supplying a mixed gas between the supporting electrode and the counter electrode such that the percentage of the acetylene gas relative to the carrier gas is 0.05% by volume or more and 10% by volume or less, and by generating plasma while a DC pulse voltage having a pulse width of 0.1 μsec or more and 5.0 μsec or less is applied to the counter electrode.
公开/授权文献
- US07923377B2 Method for forming amorphous carbon film 公开/授权日:2011-04-12
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