发明申请
- 专利标题： METHOD FOR REMOVING RESIDUES FROM A PATTERNED SUBSTRATE
- 专利标题（中）： 从图案基板上移除残留物的方法
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申请号： US12055648申请日： 2008-03-26
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公开(公告)号： US20090246958A1公开(公告)日： 2009-10-01
- 发明人: Sean D. Burns , Matthew E. Colburn , Steven J. Holmes
- 申请人： Sean D. Burns , Matthew E. Colburn , Steven J. Holmes
- 申请人地址： US NY Armonk
- 专利权人： INTERNATIONAL BUSINESS MACHINES CORPORATION
- 当前专利权人： INTERNATIONAL BUSINESS MACHINES CORPORATION
- 当前专利权人地址： US NY Armonk
- 主分类号： H01L21/311
- IPC分类号： H01L21/311
摘要：
The present invention relates to a method for removing residues from open areas of a patterned substrate involving the steps of providing a layer of a developable anti-reflective coating (DBARC) over a substrate; providing a layer of a photoresist over said DBARC layer; pattern-wise exposing said photoresist layer and said DBARC layer to a radiation; developing said photoresist layer and said DBARC layer with a first developer to form patterned structures in said photoresist and DBARC layers; depositing a layer of a developer soluble material over said patterned structures; and removing said developer soluble material with a second developer.
公开/授权文献
- US08053368B2 Method for removing residues from a patterned substrate 公开/授权日：2011-11-08
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