发明申请
US20090258503A1 METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE AND COMPUTER READABLE MEDIUM FOR STORING PATTERN SIZE SETTING PROGRAM
有权
用于制造半导体器件的方法和用于存储图案尺寸设置程序的计算机可读介质
- 专利标题： METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE AND COMPUTER READABLE MEDIUM FOR STORING PATTERN SIZE SETTING PROGRAM
- 专利标题（中）： 用于制造半导体器件的方法和用于存储图案尺寸设置程序的计算机可读介质
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申请号： US12403740申请日： 2009-03-13
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公开(公告)号： US20090258503A1公开(公告)日： 2009-10-15
- 发明人: Hiromitsu Mashita , Toshiya Kotani , Fumiharu Nakajima , Takafumi Taguchi , Chikaaki Kodama
- 申请人： Hiromitsu Mashita , Toshiya Kotani , Fumiharu Nakajima , Takafumi Taguchi , Chikaaki Kodama
- 优先权： JP2008-104550 20080414
- 主分类号： H01L21/306
- IPC分类号： H01L21/306
摘要：
A method of manufacturing a semiconductor device, which forms a pattern by performing pattern transformation steps multiple times, comprises setting finished pattern sizes for patterns to be formed in each consecutive two pattern transformation steps among the plurality of pattern transformation steps based on a possible total amount of in-plane size variation of the patterns to be formed in the consecutive two pattern transformation steps.
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