发明申请
US20090266110A1 SiO slurry for the production of quartz glass as well as the application of the slurry 有权
用于生产石英玻璃的SiO浆料以及浆料的应用

SiO slurry for the production of quartz glass as well as the application of the slurry
摘要:
A known SiO2 slurry for the production of quartz glass contains a dispersion liquid and amorphous SiO2 particles with particle sizes to a maximum of 500 μm, wherein the largest volume fraction is composed of SiO2 particles with particle sizes in the range 1 μm-60 μm, as well as SiO2 nanoparticles with particle sizes less than 100 nm in the range 0.2-15% volume by weight (of the entire solids content). In order to prepare such a slurry for use, and to optimize the flow behavior of such a slurry with regard to later processing by dressing or pouring the slurry mass, and with regard to later drying and sintering without cracks, the invention suggests a slurry with SiO2 particles with a multimodal distribution of particle sizes, with a first maximum of the sizes distribution in the range 1 μm-3 μm and a second maximum in the range 5 μm-50 μm, and a solids content (percentage by weight of the SiO2 particles and the SiO2 nanoparticles together) in the range 83%-90%.
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