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1.发明授权SiO2 slurry for the production of quartz glass as well as the application of the slurry 有权用于生产石英玻璃的SiO2浆料以及浆料的应用公开(公告)号：US08158542B2
公开(公告)日：2012-04-17
申请号：US12311446
申请日：2007-09-12
IPC分类号： C03C3/076
CPC分类号： C03C17/02 , C03B19/06 , C03B19/066 , C03B20/00 , C03C2218/11
摘要： A known SiO2 slurry for the production of quartz glass contains a dispersion liquid and amorphous SiO2 particles with particle sizes to a maximum of 500 μm, wherein the largest volume fraction is composed of SiO2 particles with particle sizes in the range 1 μm-60 μm, as well as SiO2 nanoparticles with particle sizes less than 100 nm in the range 0.2-15% volume by weight (of the entire solids content). In order to prepare such a slurry for use, and to optimize the flow behavior of such a slurry with regard to later processing by dressing or pouring the slurry mass, and with regard to later drying and sintering without cracks, the invention suggests a slurry with SiO2 particles with a multimodal distribution of particle sizes, with a first maximum of the sizes distribution in the range 1 μm-3 μm and a second maximum in the range 5 μm-50 μm, and a solids content (percentage by weight of the SiO2 particles and the SiO2 nanoparticles together) in the range 83%-90%.
摘要翻译： 用于生产石英玻璃的已知SiO 2浆料包含分散液和粒径为最大500μm的无定形SiO 2颗粒，其中最大体积分数由粒径在1μm-60μm的SiO 2颗粒组成， 以及颗粒尺寸小于100nm的SiO 2纳米颗粒在0.2-15重量％（整个固体含量）的范围内。 为了制备这样的浆料，并且通过修整或倒出浆料来优化这种浆料在后续加工过程中的流动行为，并且关于稍后的干燥和烧结而没有裂纹，本发明提出了具有 SiO 2颗粒具有多峰分布的粒径，第一最大尺寸分布在1μm-3μm范围内，第二最大值在5μm-50μm范围内，固体含量（SiO 2重量百分比 颗粒和SiO 2纳米颗粒）在83％-90％的范围内。
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2.发明申请SiO slurry for the production of quartz glass as well as the application of the slurry 有权用于生产石英玻璃的SiO浆料以及浆料的应用公开(公告)号：US20090266110A1
公开(公告)日：2009-10-29
申请号：US12311446
申请日：2007-09-12
CPC分类号： C03C17/02 , C03B19/06 , C03B19/066 , C03B20/00 , C03C2218/11
摘要： A known SiO2 slurry for the production of quartz glass contains a dispersion liquid and amorphous SiO2 particles with particle sizes to a maximum of 500 μm, wherein the largest volume fraction is composed of SiO2 particles with particle sizes in the range 1 μm-60 μm, as well as SiO2 nanoparticles with particle sizes less than 100 nm in the range 0.2-15% volume by weight (of the entire solids content). In order to prepare such a slurry for use, and to optimize the flow behavior of such a slurry with regard to later processing by dressing or pouring the slurry mass, and with regard to later drying and sintering without cracks, the invention suggests a slurry with SiO2 particles with a multimodal distribution of particle sizes, with a first maximum of the sizes distribution in the range 1 μm-3 μm and a second maximum in the range 5 μm-50 μm, and a solids content (percentage by weight of the SiO2 particles and the SiO2 nanoparticles together) in the range 83%-90%.
摘要翻译： 用于生产石英玻璃的已知SiO 2浆料含有粒径达到最大500μm的分散液和无定形SiO 2颗粒，其中最大体积分数由粒径在1m-60μm的SiO2颗粒组成， 以及颗粒尺寸小于100nm的SiO 2纳米颗粒在0.2-15重量％（整个固体含量）的范围内。 为了制备这样的浆料，并且通过修整或倒出浆料来优化这种浆料在后续加工过程中的流动行为，并且关于稍后的干燥和烧结而没有裂纹，本发明提出了具有 SiO 2颗粒具有粒径的多峰分布，其尺寸分布的第一最大值在1mum-3μm的范围内，第二最大值在5mum-50μm的范围内，固体含量（SiO 2的重量百分比 颗粒和SiO 2纳米颗粒）在83％-90％的范围内。
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公开(公告)号：US20090151848A1
公开(公告)日：2009-06-18
申请号：US12316496
申请日：2008-12-12
IPC分类号： B32B37/02
CPC分类号： C03C27/06
摘要： The present invention relates to a method for bonding components made of high silica material by way of integral joining by forming a high-silica bonding mass between connecting surfaces of the components. A method is provided which permits an inexpensive production of a mechanically and thermally stable composite of components made of a high silica material, particularly for large-area bonded connections for which a contact pressure of more than 5 N/cm2 is applied while the connecting surfaces are being fixed, and/or the path length for possible degassing products from the bonded connection is more than 150 mm. This object is achieved according to the invention in that the SiO2 bonding mass is used in dry form either right from the beginning or at least the SiO2 bonding mass is dried on the connecting surfaces before the joining process and the surfaces to be bonded are subsequently brought into contact and a firm composite is created by way of heating with formation of a SiO2 containing bonding mass.
摘要翻译： 本发明涉及通过在组件的连接表面之间形成高二氧化硅粘合质量而通过整体接合来接合由高二氧化硅材料制成的部件的方法。 提供了一种方法，其允许廉价地生产由高二氧化硅材料制成的组分的机械和热稳定复合材料，特别是对于其中施加大于5N / cm 2的接触压力的大面积接合连接，而连接表面 和/或来自粘合连接的可能脱气产物的路径长度大于150mm。 根据本发明的目的是根据本发明实现的，因为SiO 2粘结物质从一开始就以干式形式使用，或者至少在接合过程之前在连接表面上干燥SiO 2接合物质，随后将待粘合的表面 接触，并通过加热形成含有SiO 2的粘合物质形成牢固的复合材料。
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4.发明申请SiO2 SLURRY FOR THE PRODUCTION OF QUARTZ GLASS AS WELL AS THE APPLICATION OF THE SLURRY 有权二氧化硅浆料用于生产石英玻璃作为浆料的应用公开(公告)号：US20120114847A1
公开(公告)日：2012-05-10
申请号：US13340632
申请日：2011-12-29
CPC分类号： C03C17/02 , C03B19/06 , C03B19/066 , C03B20/00 , C03C2218/11
摘要： SiO2 slurry for the production of quartz glass contains a dispersion liquid and amorphous SiO2 particles with particle sizes to a maximum of 500 μm. The largest volume fraction is SiO2 particles with particle sizes of 1 μm-60 μm, as well as SiO2 nanoparticles with particle sizes less than 100 nm constituting 0.2-15% volume by weight of the entire solids content. To prepare the slurry for use and optimize its flow behavior for later processing by dressing or pouring the slurry mass, and for later drying and sintering without cracks, the slurry has SiO2 particles with a multimodal distribution of particle sizes, with a first maximum in the range 1 μm-3 μm and a second maximum in the range 5 μm-50 μm, and an 83%-90% solids content by weight of the SiO2 particles and the SiO2 nanoparticles together.
摘要翻译： 用于生产石英玻璃的SiO2浆料含有粒径达500μm的分散液和无定形SiO 2颗粒。 最大的体积分数是粒径为1μm-60μm的SiO 2颗粒，以及粒径小于100nm的SiO 2纳米颗粒，占整个固体含量的0.2-15重量％。 为了制备使用的浆料并优化其流动行为以便随后通过修整或倾倒浆料进行加工，并且为了稍后的干燥和烧结而没有裂缝，该浆料具有多晶粒度分布的SiO 2颗粒，其中第一最大值在 范围为1μm-3μm，第二最大值为5μm-50μm，并且SiO 2颗粒和SiO 2纳米颗粒的固体含量为83％-90％。
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5.发明授权SiO2 slurry for the production of quartz glass as well as the application of the slurry 有权用于生产石英玻璃的SiO2浆料以及浆料的应用公开(公告)号：US08209998B2
公开(公告)日：2012-07-03
申请号：US13340632
申请日：2011-12-29
IPC分类号： C03B20/00
CPC分类号： C03C17/02 , C03B19/06 , C03B19/066 , C03B20/00 , C03C2218/11
摘要： SiO2 slurry for the production of quartz glass contains a dispersion liquid and amorphous SiO2 particles with particle sizes to a maximum of 500 μm. The largest volume fraction is SiO2 particles with particle sizes of 1 μm-60 μm, as well as SiO2 nanoparticles with particle sizes less than 100 nm constituting 0.2-15% volume by weight of the entire solids content. To prepare the slurry for use and optimize its flow behavior for later processing by dressing or pouring the slurry mass, and for later drying and sintering without cracks, the slurry has SiO2 particles with a multimodal distribution of particle sizes, with a first maximum in the range 1 μm-3 μm and a second maximum in the range 5 μm-50 μm, and an 83%-90% solids content by weight of the SiO2 particles and the SiO2 nanoparticles together.
摘要翻译： 用于生产石英玻璃的SiO2浆料含有粒径达500μm的分散液和无定形SiO 2颗粒。 最大的体积分数是粒径为1μm-60μm的SiO 2颗粒，以及粒径小于100nm的SiO 2纳米颗粒，占整个固体含量的0.2-15重量％。 为了制备使用的浆料并优化其流动行为以便随后通过修整或倾倒浆料进行加工，并且为了稍后的干燥和烧结而没有裂缝，该浆料具有多晶粒度分布的SiO 2颗粒，其中第一最大值在 范围为1μm-3μm，第二最大值为5μm-50μm，并且SiO 2颗粒和SiO 2纳米颗粒的固体含量为83％-90％。
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6.发明申请METHOD FOR PRODUCING QUARTZ GLASS DOPED WITH NITROGEN AND QUARTZ GLASS GRAINS SUITABLE FOR CARRYING OUT THE METHOD 审中-公开用于生产适用于实施方法的硝酸盐和石英玻璃颗粒的石英玻璃的方法公开(公告)号：US20110183138A1
公开(公告)日：2011-07-28
申请号：US12737468
申请日：2009-07-16
申请人： Martin Trommer , Stefan Ochs , Juergen Weber , Waltraud Werdecker , Norbert Traeger , Helmut Leber
发明人： Martin Trommer , Stefan Ochs , Juergen Weber , Waltraud Werdecker , Norbert Traeger , Helmut Leber
CPC分类号： C03B19/1095 , C03B17/04 , C03B19/095 , C03B19/106 , C03B2201/24 , Y02P40/57 , Y10T428/268 , Y10T428/2982
摘要： In a known method for producing quartz glass that is doped with nitrogen, an SiO2 base product is prepared in the form of SiO2 grains or in the form of a porous semi-finished product produced from the SiO2 grains and the SiO2 base product is processed into the quartz glass with the nitrogen chemically bound therein in a hot process in an atmosphere containing a reaction gas containing nitrogen. From this starting point, a method is provided for achieving nitrogen doping in quartz glass with as high a fraction of chemically bound nitrogen as possible. This object is achieved according to the invention in that a nitrogen oxide is used as the nitrogen-containing reaction gas, and that a SiO2 base product is used that in the hot process has a concentration of oxygen deficient defects of at least 2×1015 cm−3, wherein the SiO2 base product comprises SiO2 particles having an average particle size in the range of 200 nm to 300 μm (D50 value).
摘要翻译： 在制造掺杂有氮的石英玻璃的已知方法中，SiO 2基底产物以SiO 2晶粒的形式制备，或以由SiO 2晶粒生成的多孔半成品的形式制备，将SiO 2基产物加工成 在含有含氮反应气体的气氛中，在热过程中氮化学结合的石英玻璃。 从这个起点，提供了一种在石英玻璃中实现氮掺杂的方法，尽可能高的一部分化学键合的氮。 根据本发明的目的是根据本发明实现氮氧化物作为含氮反应气体，并且使用SiO 2基产物，其在热处理中具有至少2×1015cm的缺氧缺陷浓度 -3，其中SiO 2基产物包含平均粒度在200nm至300μm（D50值）范围内的SiO 2颗粒。
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公开(公告)号：US20100316796A1
公开(公告)日：2010-12-16
申请号：US12792699
申请日：2010-06-02
IPC分类号： B05D3/02
CPC分类号： C03C17/001 , B41M1/12 , B41M1/34 , B41M3/003 , C03C17/04 , C03C2218/11
摘要： In a known method for producing a raised marking on a glass object, a suspension containing SiO2 particles is applied to a surface of the glass object as a pattern, and the pattern is compacted to form the marking. Starting from this, in order to enable a cost-effective production of an optically appealing and uniform marking on an object made of quartz glass, which marking is also suited for applications at high temperature or in a contamination-sensitive environment, such as in solar cell and semiconductor production, it is suggested according to the invention that a binder-free suspension be used to create a marking on a quartz glass object, the suspension containing a dispersion liquid and amorphous SiO2 particles having particle sizes of up to a maximum of 500 μm, of which are between 0.2% by wt. and 15% by wt. SiO2 nanoparticles having particle sizes of less than 100 nm, and the solids content thereof, i.e. the weight proportion of the SiO2 particles and of the SiO2 nanoparticles together, is in the range between 60% and 90%.
摘要翻译： 在玻璃制品上制造凸起标记的已知方法中，将含有SiO 2颗粒的悬浮液作为图案施加到玻璃物体的表面，并且将图案压实以形成标记。 从此开始，为了能够在由石英玻璃制成的物体上成本有效地生产光学吸引和均匀的标记，该标记也适用于高温或污染敏感环境中的应用，例如太阳能 电池和半导体生产中，根据本发明提出，使用无粘合剂的悬浮液在石英玻璃物体上产生标记，该悬浮液含有分散液和粒径可达最大值为500的分散液和无定形SiO 2颗粒 μm，其为0.2重量％。 和15重量％。 粒径小于100nm的SiO 2纳米颗粒，其固体含量，即SiO 2颗粒和SiO 2纳米颗粒的重量比在一起在60％至90％的范围内。
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8.发明授权公开(公告)号：US07947335B2
公开(公告)日：2011-05-24
申请号：US12448406
申请日：2007-12-13
申请人： Waltraud Werdecker , Rolf Gerhardt , Juergen Weber
发明人： Waltraud Werdecker , Rolf Gerhardt , Juergen Weber
CPC分类号： C03C17/25 , C03C2217/213 , C03C2217/24 , C03C2218/112 , G02B5/02 , H01J9/20 , H01J61/025 , H01J61/35 , H01K1/325 , H01K3/005 , Y10T428/26 , Y10T428/261 , Y10T428/265
摘要： Methods for producing a quartz glass component with reflector layer are known in which a reflector layer composed of quartz glass acting as a diffuse reflector is produced on at least part of the surface of a substrate body composed of quartz glass. In order, taking this as a departure point, to specify a method which enables cost-effective and reproducible production of uniform SiO2 reflector layers on quartz glass components, it is proposed according to the invention that the reflector layer is produced by thermal spraying by means of SiO2 particles being fed to an energy carrier, being incipiently melted or melted by means of said energy carrier and being deposited on the substrate body. In the case of a quartz glass component obtained according to the method, the SiO2 reflector layer is formed as a layer which is produced by thermal spraying and has an opaque effect and which is distinguished by freedom from cracks and uniformity.
摘要翻译： 制造具有反射层的石英玻璃组件的方法是已知的，其中在由石英玻璃构成的基板主体的表面的至少一部分上产生由用作漫反射器的石英玻璃构成的反射层。 为了以此作为出发点，为了指定能够在石英玻璃部件上实现均匀的SiO 2反射层的成本有效且可重复的生产的方法，根据本发明提出，反射器层是通过热喷涂 的SiO 2颗粒被馈送到能量载体，通过所述能量载体初始地熔化或熔化并沉积在基体上。 在根据该方法获得的石英玻璃组分的情况下，SiO 2反射层形成为通过热喷涂制成的层并且具有不透明效果，其区别在于不受裂缝和均匀性的限制。
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9.发明授权Holder made from quartz glass for the processing of semiconductor wafers and method for production of the holder 有权由石英玻璃制成的用于加工半导体晶片的支架和用于制造支架的方法公开(公告)号：US07749930B2
公开(公告)日：2010-07-06
申请号：US11630405
申请日：2006-03-30
申请人： Juergen Weber , Tobias Pogge , Martin Trommer , Bodo Kuehn , Ulrich Kirst , Waltraud Werdecker
发明人： Juergen Weber , Tobias Pogge , Martin Trommer , Bodo Kuehn , Ulrich Kirst , Waltraud Werdecker
CPC分类号： C03C3/06 , C03B19/06 , C03B19/09 , C03B32/00 , C03B2201/07 , C03B2201/075 , C03B2201/24 , C03B2201/32 , C03C15/00 , C03C19/00 , C03C23/0025 , C03C23/006 , C03C2201/11 , C03C2201/12 , C03C2201/23 , C03C2201/24 , C03C2201/32 , C03C2201/50 , C03C2203/54 , C30B25/12 , C30B31/14 , C30B35/00 , Y02P40/57
摘要： An ideal quartz glass for a wafer jig for use in an environment having an etching effect is distinguished by both high purity and high resistance to dry etching. To indicate a quartz glass that substantially fulfills these requirements, it is suggested according to the invention that the quartz glass is doped with nitrogen at least in a near-surface area, has a mean content of metastable hydroxyl groups of less than 30 wt ppm and that its fictive temperature is below 1250° C. and its viscosity is at least 1013 dPa·s at a temperature of 1200° C. An economic method for producing such a quartz glass comprises the following method steps: melting an SiO2 raw material to obtain a quartz glass blank, the SiO2 raw material or the quartz glass blank being subjected to a dehydration measure, heating the SiO2 raw material or the quartz glass blank to a nitriding temperature in the range between 1050° C. and 1850° C. in an ammonia-containing atmosphere, a temperature treatment by means of which the quartz glass of the quartz glass blank is set to a fictive temperature of 1250° C. or less, and a surface treatment of the quartz glass blank with formation of the quartz glass jig.
摘要翻译： 用于具有蚀刻效果的环境中的晶片夹具的理想石英玻璃的特征在于高纯度和高耐干蚀刻性。 为了表明基本满足这些要求的石英玻璃，根据本发明提出，石英玻璃至少在近表面积中掺杂氮，其平均含量小于30重量ppm， 其虚拟温度低于1250℃，在1200℃的温度下其粘度至少为1013dPa·s。制备这种石英玻璃的经济方法包括以下方法步骤：将SiO 2原料熔化得到 将石英玻璃坯料，SiO 2原料或石英玻璃坯料进行脱水处理，将SiO2原料或石英玻璃坯料加热至1050℃〜1850℃的氮化温度， 含有氨的气氛，将石英玻璃坯料的石英玻璃设定为1250℃以下的假想温度的温度处理，以及格式化的石英玻璃坯料的表面处理 在石英玻璃夹具上。
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10.发明申请QUARTZ GLASS COMPONENT WITH REFLECTOR LAYER AND METHOD FOR PRODUCING THE SAME 有权具有反射层的QUARTZ玻璃部件及其制造方法公开(公告)号：US20090316268A1
公开(公告)日：2009-12-24
申请号：US12448406
申请日：2007-12-13
申请人： Waltraud Werdecker , Rolf Gerhardt , Juergen Weber
发明人： Waltraud Werdecker , Rolf Gerhardt , Juergen Weber
CPC分类号： C03C17/25 , C03C2217/213 , C03C2217/24 , C03C2218/112 , G02B5/02 , H01J9/20 , H01J61/025 , H01J61/35 , H01K1/325 , H01K3/005 , Y10T428/26 , Y10T428/261 , Y10T428/265
摘要： Methods for producing a quartz glass component with reflector layer are known in which a reflector layer composed of quartz glass acting as a diffuse reflector is produced on at least part of the surface of a substrate body composed of quartz glass. In order, taking this as a departure point, to specify a method which enables cost-effective and reproducible production of uniform SiO2 reflector layers on quartz glass components, it is proposed according to the invention that the reflector layer is produced by thermal spraying by means of SiO2 particles being fed to an energy carrier, being incipiently melted or melted by means of said energy carrier and being deposited on the substrate body. In the case of a quartz glass component obtained according to the method, the SiO2 reflector layer is formed as a layer which is produced by thermal spraying and has an opaque effect and which is distinguished by freedom from cracks and uniformity.
摘要翻译： 制造具有反射层的石英玻璃组件的方法是已知的，其中在由石英玻璃构成的基板主体的表面的至少一部分上产生由用作漫反射器的石英玻璃构成的反射层。 为了以此作为出发点，为了指定能够在石英玻璃部件上实现均匀的SiO 2反射层的成本有效且可重复的生产的方法，根据本发明提出，反射层通过手段热喷涂 的SiO 2颗粒被馈送到能量载体，通过所述能量载体初始地熔化或熔化并沉积在基体上。 在根据该方法获得的石英玻璃组分的情况下，SiO 2反射层形成为通过热喷涂制成的层并且具有不透明效果，其区别在于不受裂缝和均匀性的限制。
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