发明申请
- 专利标题: Apparatus for Producing Trichlorosilane
- 专利标题(中): 三氯硅烷生产设备
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申请号: US12226204申请日: 2007-10-24
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公开(公告)号: US20090269259A1公开(公告)日: 2009-10-29
- 发明人: Toshiyuki Ishii , Hideo Ito , Yuji Shimizu
- 申请人: Toshiyuki Ishii , Hideo Ito , Yuji Shimizu
- 申请人地址: JP Tokyo
- 专利权人: MITSUBISHI MATERIALS CORPORATION
- 当前专利权人: MITSUBISHI MATERIALS CORPORATION
- 当前专利权人地址: JP Tokyo
- 优先权: JP2006-297035 20061031; JP2007-259446 20071003
- 国际申请: PCT/JP2007/070725 WO 20071024
- 主分类号: B01J19/00
- IPC分类号: B01J19/00
摘要:
An apparatus for producing trichlorosilane, including: a reaction vessel in which a supply gas containing silicon tetrachloride and hydrogen is supplied to an internal reaction passageway to produce a reaction product gas containing trichlorosilane and hydrogen chloride; a heating mechanism that heats the interior of the reaction vessel; a gas supply section that supplies the supply gas in the reaction vessel; and a gas discharge section that discharges the reaction product gas from the reaction vessel to the outside, wherein the reaction passageway includes: a supply side passageway which is connected to the gas supply section at a central portion of the reaction vessel and flows the supply gas toward the outside while meandering in the reaction vessel; a return passageway which is connected to a downstream end of the supply side passageway and extends to the central portion of the reaction vessel; and a discharge side passageway that is disposed so as to be connected to a downstream end of the return passageway and to adjoin the supply side passageway of the central portion of the reaction vessel, the discharge side passageway being connected to the gas discharge section.
公开/授权文献
- US09493359B2 Apparatus for producing trichlorosilane 公开/授权日:2016-11-15