发明申请
- 专利标题： SYSTEM FOR NON RADIAL TEMPERATURE CONTROL FOR ROTATING SUBSTRATES
- 专利标题（中）： 用于旋转基板的非径向温度控制系统
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申请号： US12434239申请日： 2009-05-01
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公开(公告)号： US20090274454A1公开(公告)日： 2009-11-05
- 发明人: WOLFGANG R. ADERHOLD , Aaron Hunter , Joseph M. Ranish
- 申请人： WOLFGANG R. ADERHOLD , Aaron Hunter , Joseph M. Ranish
- 申请人地址： US CA Santa Clara
- 专利权人： APPLIED MATERIALS, INC.
- 当前专利权人： APPLIED MATERIALS, INC.
- 当前专利权人地址： US CA Santa Clara
- 主分类号： F27B5/14
- IPC分类号： F27B5/14
摘要：
Embodiments of the present invention provide apparatus and method for reducing non uniformity during thermal processing. One embodiment provides an apparatus for processing a substrate comprising a chamber body defining a processing volume, a substrate support disposed in the processing volume, wherein the substrate support is configured to rotate the substrate, a sensor assembly configured to measure temperature of the substrate at a plurality of locations, and one or more pulse heating elements configured to provide pulsed energy towards the processing volume.
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