Invention Application
- Patent Title: Method for inhibiting electromigration-induced phase segregation in solder joints
- Patent Title (中): 抑制焊点中电迁移诱导相分离的方法
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Application No.: US12156560Application Date: 2008-06-02
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Publication No.: US20090294409A1Publication Date: 2009-12-03
- Inventor: Cheng-En Ho , Wei-Hsiang Wu
- Applicant: Cheng-En Ho , Wei-Hsiang Wu
- Applicant Address: TW Chung-Li
- Assignee: Yuan Ze University
- Current Assignee: Yuan Ze University
- Current Assignee Address: TW Chung-Li
- Main IPC: B23K11/00
- IPC: B23K11/00

Abstract:
A method for inhibiting electromigration-induced phase segregation suitable for solder joint configurations used in a chip package is described as following. First, a chip package including a wiring board, a chip and numbers of solder joints is provided, wherein the chip is disposed on the wiring board, and the solder joints are disposed between the chip and the wiring board to electrically connect the chip to the wiring board. Next, a first current and a second current are alternately applied to a side of the solder joints, wherein flowing directions of the first current and the second current are opposite. The current density of the first current is 103˜105 A/cm2, and the current density of the second current is 103˜105 A/cm2.
Public/Granted literature
- US08207469B2 Method for inhibiting electromigration-induced phase segregation in solder joints Public/Granted day:2012-06-26
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