发明申请
- 专利标题： Methods of treating semiconducting materials and treated semiconducting materials
- 专利标题（中）： 处理半导体材料和处理的半导体材料的方法
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申请号： US12156499申请日： 2008-06-02
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公开(公告)号： US20090297395A1公开(公告)日： 2009-12-03
- 发明人: Prantik Mazumder , Kamal Kishore Soni , Christopher Scott Thomas , Natesan Venkataraman , Glen Bennett Cook
- 申请人： Prantik Mazumder , Kamal Kishore Soni , Christopher Scott Thomas , Natesan Venkataraman , Glen Bennett Cook
- 主分类号： C01B33/02
- IPC分类号： C01B33/02 ; C30B1/02 ; C22C28/00
摘要：
A method for treating semiconducting materials is disclosed. In the disclosed method, a semiconducting material having a crystalline structure is provided, at least a portion of the semiconducting material is exposed to a heat source to create a melt pool, and the semiconducting material is then cooled. Semiconducting materials treated by the method are also disclosed.