发明申请
US20090299655A1 SYSTEMS AND METHODS FOR DETERMINING TWO OR MORE CHARACTERISTICS OF A WAFER
有权
用于确定波形的两个或更多特征的系统和方法
- 专利标题： SYSTEMS AND METHODS FOR DETERMINING TWO OR MORE CHARACTERISTICS OF A WAFER
- 专利标题（中）： 用于确定波形的两个或更多特征的系统和方法
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申请号： US12128426申请日： 2008-05-28
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公开(公告)号： US20090299655A1公开(公告)日： 2009-12-03
- 发明人: Stephen Biellak , Daniel Kavaldjiev
- 申请人： Stephen Biellak , Daniel Kavaldjiev
- 主分类号： G06F19/00
- IPC分类号： G06F19/00 ; G01N21/47
摘要：
Systems and methods for determining two or more characteristics of a wafer are provided. The two or more characteristics include a characteristic of the wafer that is spatially localized in at least one dimension and a characteristic of the wafer that is not spatially localized in two dimensions.
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