发明申请
US20090302405A1 METHOD FOR FORMING SLOT VIA BITLINE FOR MRAM DEVICES 有权
用于通过MRAM器件的位线形成槽的方法

METHOD FOR FORMING SLOT VIA BITLINE FOR MRAM DEVICES
摘要:
A magnetic random access memory (MRAM) device includes a magnetic tunnel junction (MTJ) stack formed over a lower wiring level, a hardmask formed on the MTJ stack, and an upper wiring level formed over the hardmask. The upper wiring level includes a slot via bitline formed therein, the slot via bitline in contact with the hardmask and in contact with an etch stop layer partially surrounding sidewalls of the hardmask.
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