发明申请
US20090302436A1 Semiconductor Device and Method of Forming Shielding Layer Grounded Through Metal Pillars Formed in Peripheral Region of the Semiconductor
有权
半导体器件和形成屏蔽层的方法通过在半导体的外围区域中形成的金属支柱接地
- 专利标题: Semiconductor Device and Method of Forming Shielding Layer Grounded Through Metal Pillars Formed in Peripheral Region of the Semiconductor
- 专利标题(中): 半导体器件和形成屏蔽层的方法通过在半导体的外围区域中形成的金属支柱接地
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申请号: US12136682申请日: 2008-06-10
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公开(公告)号: US20090302436A1公开(公告)日: 2009-12-10
- 发明人: OhHan Kim , SeungWon Kim , JoungUn Park
- 申请人: OhHan Kim , SeungWon Kim , JoungUn Park
- 申请人地址: SG Singapore
- 专利权人: STATS CHIPPAC, LTD.
- 当前专利权人: STATS CHIPPAC, LTD.
- 当前专利权人地址: SG Singapore
- 主分类号: H01L23/552
- IPC分类号: H01L23/552 ; H01L21/52
摘要:
A shielded semiconductor device is made by mounting semiconductor die to a first substrate. An encapsulant is formed over the semiconductor die and first substrate. A dicing channel is formed through the encapsulant between the semiconductor die. A hole is drilled in the first substrate along the dicing channel on each side of the semiconductor die. A shielding layer is formed over the encapsulant and semiconductor die. The hole is lined with the shielding layer. The first substrate is singulated to separate the semiconductor die. The first substrate is mounted to a second substrate. A metal pillar is formed in the opening to electrically connect the shielding layer to a ground plane in the second substrate. The metal pillar includes a hook for a mechanically secure connection to the shielding layer. An interconnect structure is formed on the first substrate to electrically connect the semiconductor die to the second substrate.
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