发明申请
- 专利标题: INTERFEROMETRY FOR LATERAL METROLOGY
- 专利标题(中): 横向计量学的干涉
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申请号: US12540709申请日: 2009-08-13
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公开(公告)号: US20090303493A1公开(公告)日: 2009-12-10
- 发明人: Xavier Colonna de Lega , Robert Stoner , Peter de Groot
- 申请人: Xavier Colonna de Lega , Robert Stoner , Peter de Groot
- 申请人地址: US CT Middlefield
- 专利权人: ZYGO CORPORATION
- 当前专利权人: ZYGO CORPORATION
- 当前专利权人地址: US CT Middlefield
- 主分类号: G01B11/02
- IPC分类号: G01B11/02
摘要:
A method is disclosed which includes: using a scanning interferometry system, generating a sequence of phase-shifted interferometry images at different scan positions of an object comprising a buried surface, identifying a scan position corresponding to a position of best focus for the buried surface based on the sequence of phase-shifted interferometry images of the object, and generating a final image based on the phase-shifted interferometry images and the scan position, where the interferometric fringes in the final image are reduced relative to the interferometric fringes in the phase-shifted interferometry images.
公开/授权文献
- US09025162B2 Interferometry for lateral metrology 公开/授权日:2015-05-05
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