发明申请
- 专利标题： Method of processing solid surface with gas cluster ion beam
- 专利标题（中）： 用气体簇离子束处理固体表面的方法
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申请号： US12312266申请日： 2007-10-30
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公开(公告)号： US20090305507A1公开(公告)日： 2009-12-10
- 发明人: Akiko Suzuki , Akinobu Sato , Emmanuel Bourelle , Jiro Matsuo , Toshio Seki
- 申请人： Akiko Suzuki , Akinobu Sato , Emmanuel Bourelle , Jiro Matsuo , Toshio Seki
- 申请人地址： JP TOKYO
- 专利权人： JAPAN AVIATION ELECTRONICS INDUSTRY LIMITED
- 当前专利权人： JAPAN AVIATION ELECTRONICS INDUSTRY LIMITED
- 当前专利权人地址： JP TOKYO
- 优先权： JP2006-293687 20061030
- 国际申请： PCT/JP2007/071459 WO 20071030
- 主分类号： H01L21/308
- IPC分类号： H01L21/308 ; H01L21/302
摘要：
A solid surface is processed while corner portions of a relief structure are protected from deformation. A method of processing a solid surface with a gas cluster ion beam includes a cluster protection layer formation step of forming, on the solid surface, a relief structure having protrusions with a cluster protection layer formed to cover an upper part thereof and recesses without the cluster protection layer; an irradiation step of emitting a gas cluster ion beam onto the solid surface having the relief structure formed in the cluster protection layer formation step; and a removal step of removing the cluster protection layer. A thickness T of the cluster protection layer satisfies T > nY + ( b 2 Y 2 n - nY 2 ( b 4 - 16 a 2 ) 1 2 2 ) 1 2 , where n is a dose of the gas cluster ion beam, and Y is an etching efficiency of the cluster protection layer, expressed as an etching volume per cluster (a and b are constants).
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