发明申请
- 专利标题： Powder Metallurgy Sputtering Targets and Methods Of Producing Same
- 专利标题（中）： 粉末冶金溅射靶材及其生产方法
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申请号： US12552386申请日： 2009-09-02
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公开(公告)号： US20090324439A1公开(公告)日： 2009-12-31
- 发明人: Christopher A. Michaluk , Shi Yuan , James Maguire
- 申请人： Christopher A. Michaluk , Shi Yuan , James Maguire
- 申请人地址： US MA Boston
- 专利权人： CABOT CORPORATION
- 当前专利权人： CABOT CORPORATION
- 当前专利权人地址： US MA Boston
- 主分类号： B22F1/02
- IPC分类号： B22F1/02 ; C23C8/24
摘要：
A method of forming a sputtering target and other metal articles having controlled oxygen and nitrogen content levels and the articles so formed are described. The method includes surface-nitriding a deoxidized metal powder and further includes consolidating the powder by a powder metallurgy technique. Preferred metal powders include, but are not limited to, valve metals, including tantalum, niobium, and alloys thereof.
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