发明申请
US20090324826A1 Film Deposition Apparatus, Film Deposition Method, and Computer Readable Storage Medium
审中-公开
膜沉积装置，膜沉积法和计算机可读存储介质
- 专利标题： Film Deposition Apparatus, Film Deposition Method, and Computer Readable Storage Medium
- 专利标题（中）： 膜沉积装置，膜沉积法和计算机可读存储介质
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申请号： US12147707申请日： 2008-06-27
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公开(公告)号： US20090324826A1公开(公告)日： 2009-12-31
- 发明人: Hitoshi Kato , Manabu Honma , Anthony Dip
- 申请人： Hitoshi Kato , Manabu Honma , Anthony Dip
- 主分类号： C23C16/455
- IPC分类号： C23C16/455 ; C23C16/00
摘要：
A disclosed film deposition apparatus includes a turntable having in one surface a substrate receiving portion along a turntable rotation direction; a first reaction gas supplying portion for supplying a first reaction gas; a second reaction gas supplying portion for supplying a second reaction gas; a separation area between a first process area where the first reaction gas is supplied and a second process area where the second reaction gas is supplied, the separation area including a separation gas supplying portion for supplying a first separation gas in the separation area, and a ceiling surface opposing the one surface to produce a thin space; a center area having an ejection hole for ejecting a second separation gas along the one surface; and an evacuation opening for evacuating the chamber.