发明申请
US20100002358A1 HIGH-STABILITY THIN-FILM CAPACITOR AND METHOD FOR MAKING THE SAME 有权
高稳定性薄膜电容器及其制造方法

HIGH-STABILITY THIN-FILM CAPACITOR AND METHOD FOR MAKING THE SAME
摘要:
The dielectric of a capacitor is formed by superposition of at least two thin layers made from the same metal oxide, respectively in crystalline and amorphous form and respectively presenting quadratic voltage coefficients of capacitance of opposite signs. The respective thicknesses da and dc of the amorphous and crystalline thin layers comply with the following general formulas: d a = ɛ 0  ɛ a C s   0  ( 1 1 - ( ɛ c ɛ a ) 2  γ a γ c )   and   d c = ɛ 0  ɛ c C s   0  ( 1 1 - ( ɛ a ɛ c ) 2  γ c γ a ) in which ε0 corresponds to the electric constant, εc and εa correspond to the relative permittivity of the metal oxide respectively in crystalline form and in amorphous form, Cs0 corresponds to the total surface capacitance at zero field, and γc and γa correspond to the quadratic coefficient of capacitance with respect to the electric field of the metal oxide respectively in crystalline form and in amorphous form.
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