发明申请
- 专利标题: HIGH-STABILITY THIN-FILM CAPACITOR AND METHOD FOR MAKING THE SAME
- 专利标题(中): 高稳定性薄膜电容器及其制造方法
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申请号: US12311529申请日: 2007-10-16
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公开(公告)号: US20100002358A1公开(公告)日: 2010-01-07
- 发明人: Emmanuel Defay , Julie Guillan , Serge Blonkowski
- 申请人: Emmanuel Defay , Julie Guillan , Serge Blonkowski
- 申请人地址: FR Paris FR Crolles
- 专利权人: COMMISSARIAT A L'ENERGIE ATOMIQUE,STMICROELECTRONICS (CROLLES 2) S.A.S.
- 当前专利权人: COMMISSARIAT A L'ENERGIE ATOMIQUE,STMICROELECTRONICS (CROLLES 2) S.A.S.
- 当前专利权人地址: FR Paris FR Crolles
- 优先权: FR0609177 20061019
- 国际申请: PCT/FR2007/001701 WO 20071016
- 主分类号: H01G4/00
- IPC分类号: H01G4/00 ; B05D5/12 ; G01R27/26
摘要:
The dielectric of a capacitor is formed by superposition of at least two thin layers made from the same metal oxide, respectively in crystalline and amorphous form and respectively presenting quadratic voltage coefficients of capacitance of opposite signs. The respective thicknesses da and dc of the amorphous and crystalline thin layers comply with the following general formulas: d a = ɛ 0 ɛ a C s 0 ( 1 1 - ( ɛ c ɛ a ) 2 γ a γ c ) and d c = ɛ 0 ɛ c C s 0 ( 1 1 - ( ɛ a ɛ c ) 2 γ c γ a ) in which ε0 corresponds to the electric constant, εc and εa correspond to the relative permittivity of the metal oxide respectively in crystalline form and in amorphous form, Cs0 corresponds to the total surface capacitance at zero field, and γc and γa correspond to the quadratic coefficient of capacitance with respect to the electric field of the metal oxide respectively in crystalline form and in amorphous form.
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