发明申请
- 专利标题： Spectral Purity Filters for Use in a Lithographic Apparatus
- 专利标题（中）： 光谱纯度滤光片用于平版印刷设备
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申请号： US12500198申请日： 2009-07-09
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公开(公告)号： US20100020304A1公开(公告)日： 2010-01-28
- 发明人: Wouter Anthon Soer , Maarten Marinus Johannes Wilhelmus Van Herpen , Vadim Yevgenyevich Banine , Andrey Mikhailovich Yakunin , Martin Jacobus Johan Jak
- 申请人： Wouter Anthon Soer , Maarten Marinus Johannes Wilhelmus Van Herpen , Vadim Yevgenyevich Banine , Andrey Mikhailovich Yakunin , Martin Jacobus Johan Jak
- 申请人地址： NL Veldhoven
- 专利权人： ASML Netherlands B.V.
- 当前专利权人： ASML Netherlands B.V.
- 当前专利权人地址： NL Veldhoven
- 主分类号： G03B27/72
- IPC分类号： G03B27/72 ; G02B27/42 ; G02B5/28
摘要：
According to an aspect of the present invention, a spectral purity filter includes an aperture, the aperture being arranged to diffract a first wavelength of radiation and to allow at least a portion of a second wavelength of radiation to be transmitted through the aperture, the second wavelength of radiation being shorter than the first wavelength of radiation, wherein the aperture has a diameter greater than 20 μm.
公开/授权文献
- US08390788B2 Spectral purity filters for use in a lithographic apparatus 公开/授权日：2013-03-05
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