发明申请
- 专利标题: METHOD FOR IMPROVED UTILIZATION OF SEMICONDUCTOR MATERIAL
- 专利标题(中): 改善半导体材料利用的方法
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申请号: US12025253申请日: 2008-02-04
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公开(公告)号: US20100029022A1公开(公告)日: 2010-02-04
- 发明人: Frank FEHRMANN , Juliane Busch , Volker Hansel , Daniel Ouellette , Stojan Kanev
- 申请人: Frank FEHRMANN , Juliane Busch , Volker Hansel , Daniel Ouellette , Stojan Kanev
- 申请人地址: DE Sacka
- 专利权人: SUSS MicroTec Test Systems GmbH
- 当前专利权人: SUSS MicroTec Test Systems GmbH
- 当前专利权人地址: DE Sacka
- 优先权: DE102007006067.1 20070202
- 主分类号: H01L21/66
- IPC分类号: H01L21/66 ; H01L21/67
摘要:
In a method for producing semiconductor components, in which chips are structured, tested, and isolated into dies on a wafer, in the event of a wafer being broken during the method, undamaged chips of a fragment of the wafer delimited by at least one edge section and at least one fracture contour are processed further as usual. The method has the result that the yield of usable chips is significantly increased in relation to the discarding and disposal of broken wafers provided in the prior art. The average production costs of electronic components and the loss of valuable semiconductor materials and the costs for the disposal of the fragments viewed as discards up to this point are thus significantly reduced.
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