发明申请
- 专利标题: SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREOF
- 专利标题(中): 半导体器件及其制造方法
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申请号: US12578650申请日: 2009-10-14
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公开(公告)号: US20100038618A1公开(公告)日: 2010-02-18
- 发明人: Tamae TAKANO , Kiyoshi KATO , Hideaki KUWABARA
- 申请人: Tamae TAKANO , Kiyoshi KATO , Hideaki KUWABARA
- 申请人地址: JP Kanagawa-ken
- 专利权人: SEMICONDUCTOR ENERGY LABORATORY CO., LTD.
- 当前专利权人: SEMICONDUCTOR ENERGY LABORATORY CO., LTD.
- 当前专利权人地址: JP Kanagawa-ken
- 优先权: JP2006-047057 20060223
- 主分类号: H01L45/00
- IPC分类号: H01L45/00
摘要:
The invention provides a novel memory for which process technology is relatively simple and which can store multivalued information by a small number of elements. A part of a shape of the first electrode in the first storage element is made different from a shape of the first electrode in the second storage element, and thereby voltage values which change electric resistance between the first electrode and the second electrode are varied, so that one memory cell stores multivalued information over one bit. By partially processing the first electrode, storage capacity per unit area can be increased.
公开/授权文献
- US08642987B2 Semiconductor device and manufacturing method thereof 公开/授权日:2014-02-04
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