Invention Application
- Patent Title: Metal Deposition
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Application No.: US12608326Application Date: 2009-10-29
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Publication No.: US20100044080A1Publication Date: 2010-02-25
- Inventor: Lex Kosowsky
- Applicant: Lex Kosowsky
- Main IPC: H05K1/00
- IPC: H05K1/00 ; C25D5/00 ; C25D5/02 ; C25D5/48

Abstract:
Systems and methods include depositing one or more materials on a voltage switchable dielectric material. In certain aspects, a voltage switchable dielectric material is disposed on a conductive backplane. In some embodiments, a voltage switchable dielectric material includes regions having different characteristic voltages associated with deposition thereon. Some embodiments include masking, and may include the use of a removable contact mask. Certain embodiments include electrografting. Some embodiments include an intermediate layer disposed between two layers.
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