发明申请
US20100044091A1 ELECTRODE STRUCTURE AND METHOD FOR FORMING BUMP 有权
电极结构和形成BUMP的方法

ELECTRODE STRUCTURE AND METHOD FOR FORMING BUMP
摘要:
An electrode structure 100 on which a solder bump is placed includes an electrode pattern 50 made of an electrode-constituting material selected from the group consisting of Cu, Al, Cr, and Ti, a Ni layer 52 formed on a part of the electrode pattern 50, a Pd layer 54 formed on at least a part of a region other than the part of the electrode pattern 50, and an Au layer 56 formed on the Ni layer 52 and the Pd layer 54.
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