发明申请
US20100051892A1 NONVOLATILE SEMICONDUCTOR MEMORY APPARATUS AND MANUFACTURING METHOD THEREOF 有权
非易失性半导体存储器及其制造方法

  • 专利标题: NONVOLATILE SEMICONDUCTOR MEMORY APPARATUS AND MANUFACTURING METHOD THEREOF
  • 专利标题(中): 非易失性半导体存储器及其制造方法
  • 申请号: US12446964
    申请日: 2007-10-22
  • 公开(公告)号: US20100051892A1
    公开(公告)日: 2010-03-04
  • 发明人: Takumi MikawaTakeshi Takagi
  • 申请人: Takumi MikawaTakeshi Takagi
  • 优先权: JP2006-288577 20061024
  • 国际申请: PCT/JP2007/070546 WO 20071022
  • 主分类号: H01L47/00
  • IPC分类号: H01L47/00 H01L21/16
NONVOLATILE SEMICONDUCTOR MEMORY APPARATUS AND MANUFACTURING METHOD THEREOF
摘要:
A nonvolatile semiconductor memory apparatus (10) of the present invention comprises a semiconductor substrate (11), an active element forming region provided on the semiconductor substrate (11) and including a plurality of active elements (12), a wire forming region which is provided on the active element forming region to electrically connect the active elements (12) and includes plural layers of semiconductor electrode wires (15, 16), a memory portion forming region (100) which is provided above the wire forming region and provided with memory portions (26) arranged in matrix, a resistance value of each of the memory portions changing according to electric pulses applied, and an oxygen barrier layer (17) which is provided between the memory portion forming region (100) and the wire forming region so as to extend continuously over at least an entire of the memory portion forming region (100).
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