发明申请
- 专利标题: SEMICONDUCTOR PACKAGE AND FABRICATION METHOD THEREOF
- 专利标题(中): 半导体封装及其制造方法
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申请号: US12616834申请日: 2009-11-12
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公开(公告)号: US20100052146A1公开(公告)日: 2010-03-04
- 发明人: Yih-Jenn Jiang , Han-Ping Pu , Chien-Ping Huang , Cheng-Hsu Hsiao
- 申请人: Yih-Jenn Jiang , Han-Ping Pu , Chien-Ping Huang , Cheng-Hsu Hsiao
- 申请人地址: TW Taichung
- 专利权人: SILICONWARE PRECISION INDUSTRIES CO., LTD.
- 当前专利权人: SILICONWARE PRECISION INDUSTRIES CO., LTD.
- 当前专利权人地址: TW Taichung
- 优先权: TW095142520 20061117
- 主分类号: H01L23/522
- IPC分类号: H01L23/522 ; H01L21/56
摘要:
A semiconductor package and a fabrication method are disclosed. The fabrication method includes applying a sacrificial layer on one surface of a metal carrier, applying an insulation layer on the sacrificial layer, and forming through holes in the sacrificial layer and the insulation layer to expose the metal carrier; forming a conductive metallic layer in each through hole; forming a patterned circuit layer on the insulation layer to be electrically connected to the conductive metallic layer; mounting at least a chip on the insulation layer and electrically connecting the chip to the patterned circuit layer; forming an encapsulant to encapsulate the chip and the patterned circuit layer; and removing the metal carrier and the sacrificial layer to expose the insulation layer and conductive metallic layer to allow the conductive metallic layer to protrude from the insulation layer. In the present invention, the distance between the semiconductor package and the external device is increased, and thermal stress caused by difference between the thermal expansion coefficients is reduced, so as to enhance the reliability of the product.
公开/授权文献
- US07993967B2 Semiconductor package fabrication method 公开/授权日:2011-08-09
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