发明申请
US20100055609A1 COMPOUND, METHOD FOR PREPARING THE COMPOUND AND RESIST COMPOSITION CONTAINING THE COMPOUND 有权
化合物,用于制备化合物的方法和含有该化合物的抗蚀剂组合物

  • 专利标题: COMPOUND, METHOD FOR PREPARING THE COMPOUND AND RESIST COMPOSITION CONTAINING THE COMPOUND
  • 专利标题(中): 化合物,用于制备化合物的方法和含有该化合物的抗蚀剂组合物
  • 申请号: US12552085
    申请日: 2009-09-01
  • 公开(公告)号: US20100055609A1
    公开(公告)日: 2010-03-04
  • 发明人: Ichiki TAKEMOTONobuo AndoMitsuhiro Hata
  • 申请人: Ichiki TAKEMOTONobuo AndoMitsuhiro Hata
  • 优先权: JP2008-225072 20080902
  • 主分类号: G03F7/004
  • IPC分类号: G03F7/004 C07C69/63
COMPOUND, METHOD FOR PREPARING THE COMPOUND AND RESIST COMPOSITION CONTAINING THE COMPOUND
摘要:
A compounds represented by the Formula (I) or the Formula (I′). wherein Z1 and Z2 independently represent a hydrogen atom, a C1 to C12 alkyl group or a C3 to C12 cyclic saturated hydrocarbon group, provided that at least one of Z1 and Z2 represent a C1 to C12 alkyl group or a C3 to C12 cyclic saturated hydrocarbon group; rings Y1 and Y2 independently represents an optionally substituted C3 to C20 alicyclic hydrocarbon group; Q1 to Q4 and Q′1 to Q′4 independently represent a fluorine atom or a C1 to C6 perfluoroalkyl group; and m and n independently represent an integer of 0 to 5.
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