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    Chemically amplified positive resist composition
    3.
    发明授权
    Chemically amplified positive resist composition 有权
    化学放大正光刻胶组合物

    公开(公告)号：US08057983B2

    公开(公告)日：2011-11-15

    申请号：US12425942

    申请日：2009-04-17

    申请人： Yusuke Fuji ,  Junji Shigematsu ,  Takayuki Miyagawa ,  Nobuo Ando ,  Ichiki Takemoto

    发明人： Yusuke Fuji ,  Junji Shigematsu ,  Takayuki Miyagawa ,  Nobuo Ando ,  Ichiki Takemoto

    IPC分类号： G03F7/004

    CPC分类号： G03F7/0397 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/0395 ,  G03F7/2041 ,  Y10S430/108 ,  Y10S430/111

    摘要： The present invention provides a chemically amplified resist composition comprising: a resin (A) which contains no fluorine atom and a structural unit (a1) having an acid-labile group in a side chain, a resin (B) which contains a structural unit (b2) having a fluorine-containing group in a side chain and at least one structural unit selected from the group consisting of a structural unit (b1) having an acid-labile group, a structural unit (b3) having a hydroxyl group and a structural unit (b4) having a lactone structure in a side chain, and an acid generator, wherein the amount of the resin (B) is 2 parts by weight or less per 100 parts by weight of the resin (A).

    摘要翻译： 本发明提供了一种化学放大抗蚀剂组合物，其包含：不含氟原子的树脂（A）和侧链具有酸不稳定基团的结构单元（a1），含有结构单元的树脂（B） b2）和具有酸不稳定基团的结构单元（b1），具有羟基的结构单元（b3）和结构单元（b3）的至少一种结构单元，在侧链中具有含氟基团， 在侧链中具有内酯结构的单元（b4）和酸产生剂，其中树脂（B）的量相对于树脂（A）每100重量份为2重量份以下。

    PHOTORESIST COMPOSITION
    4.
    发明申请
    PHOTORESIST COMPOSITION 审中-公开
    光电组合物

    公开(公告)号：US20110189610A1

    公开(公告)日：2011-08-04

    申请号：US13018457

    申请日：2011-02-01

    申请人： Nobuo ANDO ,  Ichiki TAKEMOTO

    发明人： Nobuo ANDO ,  Ichiki TAKEMOTO

    IPC分类号： G03F7/20 ,  G03F7/004

    CPC分类号： G03F7/004 ,  G03F7/20

    摘要： The present invention provides a photoresist composition comprising a compound represented by the formula (I): wherein R1, R2, R3 and R4 independently represent a hydrogen atom etc., X1 to X8 independently represent a hydrogen atom or a group represented by the formula (II): wherein R11 and R12 independently represent a hydrogen atom etc., m represents an integer of 1 to 4, R13 represents a C1-C6 alkyl group etc., and ring Y1 represents a C3-C20 saturated hydrocarbon ring, and an acid generator represented by the formula (B1): wherein Q1 and Q2 independently represent a fluorine atom etc., Lb1 represents a C1-C17 saturated divalent hydrocarbon group in which one or more —CH2— can be replaced by —O— or —CO—, Y represents a C1-C18 aliphatic hydrocarbon group etc., and Z+ represents an organic cation.

    摘要翻译： 本发明提供了包含式（I）表示的化合物的光致抗蚀剂组合物：其中R1，R2，R3和R4独立地表示氢原子等，X1至X8独立地表示氢原子或由式 II）：其中R11和R12独立地表示氢原子等，m表示1〜4的整数，R13表示C1-C6烷基等，Y1表示C3-C20饱和烃环，酸 式（B1）表示的化合物：其中Q1和Q2独立地表示氟原子等，Lb1表示C1-C17饱和二价烃基，其中一个或多个-CH 2 - 可以被-O-或-CO- Y表示C1〜C18脂肪族烃基等，Z +表示有机阳离子。

    COMPOUND AND CHEMICALLY AMPLIFIED RESIST COMPOSITION CONTAINING THE SAME
    5.
    发明申请
    COMPOUND AND CHEMICALLY AMPLIFIED RESIST COMPOSITION CONTAINING THE SAME 失效
    化合物和化学抑制剂组合物

    公开(公告)号：US20100151379A1

    公开(公告)日：2010-06-17

    申请号：US12631061

    申请日：2009-12-04

    申请人： Ichiki Takemoto ,  Nobuo Ando

    发明人： Ichiki Takemoto ,  Nobuo Ando

    IPC分类号： G03F7/004 ,  C07D311/96 ,  C07D311/02

    CPC分类号： C07D311/02 ,  C07D311/96 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/0392 ,  Y10S430/122 ,  Y10S430/126

    摘要： The present invention provides a compound represented by the formula (I): wherein P1, P2, P3, P4 and P5 each independently represents a hydrogen atom etc., and at least one selected from the group consisting of R1, R2, R3, R4, R5, R6, R7, R8 and R9 is the group represented by the formula (II): wherein X1 and X2 each independently represent a hydrogen atom etc., n represents an integer of 1 to 4, Z1 represents a C1-C6 alkyl group etc., and ring Y represents an alicyclic hydrocarbon group, and the others each independently represent a hydrogen atom, a C1-C6 alkyl group or a hydroxyl group, and a chemically amplified resist composition containing the same.

    摘要翻译： 本发明提供由式（I）表示的化合物：其中P1，P2，P3，P4和P5各自独立地表示氢原子等，以及选自由R1，R2，R3，R4 ，R 5，R 6，R 7，R 8和R 9为由式（II）表示的基团：其中X 1和X 2各自独立地表示氢原子等，n表示1至4的整数，Z 1表示C 1 -C 6烷基 基团等，环Y表示脂环烃基，其余各自独立地表示氢原子，C1-C6烷基或羟基，以及含有该烷氧基的化学放大抗蚀剂组合物。

    COMPOUND, METHOD FOR PREPARING THE COMPOUND AND RESIST COMPOSITION CONTAINING THE COMPOUND
    6.
    发明申请
    COMPOUND, METHOD FOR PREPARING THE COMPOUND AND RESIST COMPOSITION CONTAINING THE COMPOUND 有权
    化合物，用于制备化合物的方法和含有该化合物的抗蚀剂组合物

    公开(公告)号：US20100055609A1

    公开(公告)日：2010-03-04

    申请号：US12552085

    申请日：2009-09-01

    申请人： Ichiki TAKEMOTO ,  Nobuo Ando ,  Mitsuhiro Hata

    发明人： Ichiki TAKEMOTO ,  Nobuo Ando ,  Mitsuhiro Hata

    IPC分类号： G03F7/004 ,  C07C69/63

    CPC分类号： C07C67/08 ,  C07C67/11 ,  C07C69/63 ,  C07C2601/02 ,  C07C2601/04 ,  C07C2601/08 ,  C07C2601/14 ,  C07C2602/42 ,  C07C2603/74 ,  G03F7/0045 ,  G03F7/0392

    摘要： A compounds represented by the Formula (I) or the Formula (I′). wherein Z1 and Z2 independently represent a hydrogen atom, a C1 to C12 alkyl group or a C3 to C12 cyclic saturated hydrocarbon group, provided that at least one of Z1 and Z2 represent a C1 to C12 alkyl group or a C3 to C12 cyclic saturated hydrocarbon group; rings Y1 and Y2 independently represents an optionally substituted C3 to C20 alicyclic hydrocarbon group; Q1 to Q4 and Q′1 to Q′4 independently represent a fluorine atom or a C1 to C6 perfluoroalkyl group; and m and n independently represent an integer of 0 to 5.

    摘要翻译： 由式（I）或式（I'）表示的化合物。 其中Z 1和Z 2独立地表示氢原子，C 1至C 12烷基或C 3至C 12环状饱和烃基，条件是Z 1和Z 2中的至少一个表示C 1至C 12烷基或C 3至C 12环状饱和烃 组; 环Y1和Y2独立地表示任选取代的C 3至C 20脂环族烃基; Q1至Q4和Q'1至Q'4独立地表示氟原子或C1至C6全氟烷基; m和n独立地表示0〜5的整数。

    Resist composition
    10.
    发明授权
    Resist composition 有权
    抗蚀组成

    公开(公告)号：US06245478B1

    公开(公告)日：2001-06-12

    申请号：US09398998

    申请日：1999-09-17

    申请人： Yasunori Uetani ,  Ichiki Takemoto

    发明人： Yasunori Uetani ,  Ichiki Takemoto

    IPC分类号： G03F7023

    CPC分类号： G03F7/0045 ,  G03F7/0085 ,  G03F7/0226 ,  G03F7/038 ,  G03F7/039 ,  Y10S430/121

    摘要： A resist composition exhibiting an improved profile performance without impairing the resolution, the sensitivity, etc. which comprises a binder component; a radiation-sensitive component; and a succinimide compound represented by the following formula (I): wherein Q1 represents an alkyl group which may be optionally substituted with alkoxy, halogen or nitro, an alicyclic hydrocarbon residue, an aryl group, or an aralkyl group; and Q2, which may be the same as or different from Q1, represents hydrogen, an alkyl group which may be optionally substituted with alkoxy, halogen or nitro, an alicyclic hydrocarbon residue, an aryl group, or an aralkyl group.

    摘要翻译： 抗蚀剂组合物，其表现出改进的轮廓性能，而不损害包括粘结剂成分的分辨率，灵敏度等; 辐射敏感组件; 和由下式（I）表示的琥珀酰亚胺化合物：其中Q1表示可任选被烷氧基，卤素或硝基取代的烷基，脂环族烃残基，芳基或芳烷基; 和可以与Q1相同或不同的Q2表示氢，可以任选被烷氧基，卤素或硝基取代的烷基，脂环族烃残基，芳基或芳烷基。