发明申请
- 专利标题: EXPOSURE APPARATUS AND DEVICE FABRICATION METHOD
- 专利标题(中): 曝光装置和装置制造方法
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申请号: US12553703申请日: 2009-09-03
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公开(公告)号: US20100060872A1公开(公告)日: 2010-03-11
- 发明人: Shin Takano , Hideki Matsumoto , Yoshihiro Omameuda
- 申请人: Shin Takano , Hideki Matsumoto , Yoshihiro Omameuda
- 申请人地址: JP Tokyo
- 专利权人: CANON KABUSHIKI KAISHA
- 当前专利权人: CANON KABUSHIKI KAISHA
- 当前专利权人地址: JP Tokyo
- 优先权: JP2008-229066 20080905; JP2009-143669 20090616
- 主分类号: G03B27/42
- IPC分类号: G03B27/42 ; G03B27/54
摘要:
The present invention provides an apparatus including a calculating unit which calculates a first time serving as a time required to drive a stage in a non-scanning direction perpendicular to a scanning direction, and a second time serving as a time required to drive the stage in the scanning direction, both of which range from when exposure of one of the plurality of shot regions ends until exposure of the next shot region starts, and an adjusting unit which adjusts, when the first time is longer than the second time, one of a time for which an acceleration of the stage nonlinearly changes in the process of reversing the scanning direction, and a settling time taken for the stage to settle from when acceleration of the stage ends until exposure starts, so that the second time becomes longer than the first time in driving the stage in the scanning direction.
公开/授权文献
- US08319942B2 Exposure apparatus and device fabrication method 公开/授权日:2012-11-27
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