发明申请
US20100060875A1 OPTOFLUIDIC LITHOGRAPHY SYSTEM, METHOD OF MANUFACTURING TWO-LAYERED MICROFLUIDIC CHANNEL, AND METHOD OF MANUFACTURING THREE-DIMENSIONAL MICROSTRUCTURES
有权
OPTOFLUIDIC LITHOGRAPHY系统，制造两层微流体通道的方法和制造三维微结构的方法
- 专利标题： OPTOFLUIDIC LITHOGRAPHY SYSTEM, METHOD OF MANUFACTURING TWO-LAYERED MICROFLUIDIC CHANNEL, AND METHOD OF MANUFACTURING THREE-DIMENSIONAL MICROSTRUCTURES
- 专利标题（中）： OPTOFLUIDIC LITHOGRAPHY系统，制造两层微流体通道的方法和制造三维微结构的方法
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申请号： US12555428申请日： 2009-09-08
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公开(公告)号： US20100060875A1公开(公告)日： 2010-03-11
- 发明人: Sunghoon Kwon , SeungAh Lee , Wook Park , SuEun Chung
- 申请人： Sunghoon Kwon , SeungAh Lee , Wook Park , SuEun Chung
- 优先权： KR10-2008-0088683 20080909
- 主分类号： G03B27/54
- IPC分类号： G03B27/54 ; B32B37/02 ; B05D3/06
摘要：
An optofluidic lithography system including a membrane, a microfluidic channel, and a pneumatic chamber is provided. The membrane may be positioned between a pneumatic chamber and a microfluidic channel. The microfluidic channel may have a height corresponding to a displacement of the membrane and have a fluid flowing therein, the fluid being cured by light irradiated from the bottom to form a microstructure. The pneumatic chamber may induce the displacement of the membrane depending on an internal atmospheric pressure thereof.
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