Light emitting diode coating method
    7.
    发明授权
    Light emitting diode coating method 有权
    发光二极管涂层方法

    公开(公告)号:US08410517B2

    公开(公告)日:2013-04-02

    申请号:US12811794

    申请日:2009-01-06

    IPC分类号: H01L33/00 H01L21/00

    摘要: Provided is a light emitting diode (hereinafter, referred to as an LED) coating method, and more particularly, an LED coating method that can be used to coat a phosphor, a molding, etc., on an LED.The LED coating method includes (a) preparing a substrate and a plurality of LEDs arranged on the substrate; (b) applying a photoresist onto the substrate and the plurality of LEDs; and (c) selectively exposing the photoresist to light to form a first coating on surfaces of the plurality of LEDs. Here, the first coating is formed by curing the photoresist.

    摘要翻译: 提供了一种发光二极管(以下称为LED)涂覆方法,更具体地,涉及一种可用于在LED上涂覆荧光体,模制品等的LED涂覆方法。 LED涂覆方法包括(a)制备基板和布置在基板上的多个LED; (b)在基板和多个LED上施加光致抗蚀剂; 和(c)选择性地将光致抗蚀剂曝光以在多个LED的表面上形成第一涂层。 这里,通过固化光刻胶形成第一涂层。

    LIGHT EMITTING DIODE COATING METHOD
    8.
    发明申请
    LIGHT EMITTING DIODE COATING METHOD 有权
    发光二极管涂层方法

    公开(公告)号:US20100276716A1

    公开(公告)日:2010-11-04

    申请号:US12811794

    申请日:2009-01-06

    IPC分类号: H01L33/26 H01L33/08

    摘要: Provided is a light emitting diode (hereinafter, referred to as an LED) coating method, and more particularly, an LED coating method that can be used to coat a phosphor, a molding, etc., on an LED.The LED coating method includes (a) preparing a substrate and a plurality of LEDs arranged on the substrate; (b) applying a photoresist onto the substrate and the plurality of LEDs; and (c) selectively exposing the photoresist to light to form a first coating on surfaces of the plurality of LEDs. Here, the first coating is formed by curing the photoresist.

    摘要翻译: 提供了一种发光二极管(以下称为LED)涂覆方法,更具体地,涉及一种可用于在LED上涂覆荧光体,模制品等的LED涂覆方法。 LED涂覆方法包括(a)制备基板和布置在基板上的多个LED; (b)在基板和多个LED上施加光致抗蚀剂; 和(c)选择性地将光致抗蚀剂曝光以在多个LED的表面上形成第一涂层。 这里,通过固化光刻胶形成第一涂层。

    METHODS FOR UNIFORM METAL IMPREGNATION INTO A NANOPOROUS MATERIAL
    10.
    发明申请
    METHODS FOR UNIFORM METAL IMPREGNATION INTO A NANOPOROUS MATERIAL 有权
    将金属均匀分解成纳米材料的方法

    公开(公告)号:US20130243656A1

    公开(公告)日:2013-09-19

    申请号:US13730431

    申请日:2012-12-28

    IPC分类号: G01N21/65

    摘要: The methods, systems 400 and apparatus disclosed herein concern metal 150 impregnated porous substrates 110, 210, Certain embodiments of the invention concern methods for producing metal-coated porous silicon substrates 110, 210 that exhibit greatly improved uniformity and depth of penetration of metal 150 deposition. The increased uniformity and depth allow improved and more reproducible Raman detection of analytes. In exemplary embodiments of the invention, the methods may comprise oxidation of porous silicon 110, immersion in a metal salt solution, 130, drying and thermal decomposition of the metal salt 140 to form a metal deposit 150. In other exemplary embodiments of the invention, the methods may comprise microfluidic impregnation of porous silicon substrates 210 with one or more metal salt solutions 130. Other embodiments of the invention concern apparatus and/or systems 400 for Raman detection of analytes, comprising metal-coated porous silicon substrates 110, 210 prepared by the disclosed methods.

    摘要翻译: 本文公开的方法,系统400和装置涉及金属150浸渍的多孔基材110,210。本发明的某些实施方案涉及用于制造金属涂覆的多孔硅基板110,210的方法,其显示出显着改善金属150沉积物的均匀性和深度的渗透 。 增加的均匀性和深度允许分析物的改进和更可重复的拉曼检测。 在本发明的示例性实施方案中,所述方法可以包括多孔硅110的氧化,浸入金属盐溶液130,金属盐140的干燥和热分解以形成金属沉积物150.在本发明的其它示例性实施方案中, 该方法可以包括多孔硅衬底210与一种或多种金属盐溶液130的微流体浸渍。本发明的其它实施方案涉及用于分析物的拉曼检测的装置和/或系统400,包括金属涂覆的多孔硅衬底110,210,由 公开的方法。