发明申请
US20100063764A1 USE OF DIFFERENT PAIRS OF OVERLAY LAYERS TO CHECK AN OVERLAY MEASUREMENT RECIPE
审中-公开
使用不同层次的覆盖层检查覆盖层测量
- 专利标题： USE OF DIFFERENT PAIRS OF OVERLAY LAYERS TO CHECK AN OVERLAY MEASUREMENT RECIPE
- 专利标题（中）： 使用不同层次的覆盖层检查覆盖层测量
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申请号： US12208140申请日： 2008-09-10
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公开(公告)号： US20100063764A1公开(公告)日： 2010-03-11
- 发明人: Limin Lou , Johnson Lim , Fenghong Zhang , Ching-Hwa Chen
- 申请人： Limin Lou , Johnson Lim , Fenghong Zhang , Ching-Hwa Chen
- 主分类号： G01P21/00
- IPC分类号： G01P21/00
摘要：
An overlay measurement recipe is checked for reliability as follows. A first pair of overlay layers (130, 150) is formed (610), and the recipe is used to obtain alignment measurements for the two layers. Then another pair of overlay layers (130, 150) is obtained (630), possibly using the same masks, but this time at least one of the layers (150) is offset from its previous position. The overlay measurement recipe is used again to obtain alignment measurements (640). The two sets of measurements are checked against the offset of the layers from their previous positions to validate the recipe. Other embodiments are also provided.
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