发明申请
US20100065954A1 BOND PAD STRUCTURES AND SEMICONDUCTOR DEVICES USING THE SAME 有权
使用相同的BOND PAD结构和半导体器件

  • 专利标题: BOND PAD STRUCTURES AND SEMICONDUCTOR DEVICES USING THE SAME
  • 专利标题(中): 使用相同的BOND PAD结构和半导体器件
  • 申请号: US12621485
    申请日: 2009-11-18
  • 公开(公告)号: US20100065954A1
    公开(公告)日: 2010-03-18
  • 发明人: Chao-Chun TuYang-Hui Fang
  • 申请人: Chao-Chun TuYang-Hui Fang
  • 主分类号: H01L23/52
  • IPC分类号: H01L23/52 H01L23/522
BOND PAD STRUCTURES AND SEMICONDUCTOR DEVICES USING THE SAME
摘要:
A semiconductor device comprises a first semiconductor die and a second semiconductor die. The first semiconductor die comprises a at least one first bond pads formed on a peripheral region of the first semiconductor die, a at least one re-distributed layer (RDL) pads formed on a center region of the first semiconductor die, and a at least one wire routes interconnecting the first bond pads and the RDL pads. The second semiconductor die is disposed over the first semiconductor die, wherein the second semiconductor die has a at least one second bond pads electrically connecting to the RDL pads via bonding wires; wherein the RDL pad is supported by at least a buffer layer.
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