发明申请
- 专利标题: BOTTOM ANTIREFLECTIVE COATINGS EXHIBITING ENHANCED WET STRIP RATES, BOTTOM ANTIREFLECTIVE COATING COMPOSITIONS FOR FORMING BOTTOM ANTIREFLECTIVE COATINGS, AND METHODS FOR FABRICATING THE SAME
- 专利标题(中): 底部抗反射涂层展示增强的湿度条纹率,底部抗反射涂层组合物,用于形成底部抗反射涂层及其制造方法
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申请号: US12234849申请日: 2008-09-22
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公开(公告)号: US20100075248A1公开(公告)日: 2010-03-25
- 发明人: Sudip Mukhopadhyay , Joseph Kennedy , Yamini Pandey , Jelena Sepa
- 申请人: Sudip Mukhopadhyay , Joseph Kennedy , Yamini Pandey , Jelena Sepa
- 申请人地址: US NJ Morristown
- 专利权人: HONEYWELL INTERNATIONAL INC.
- 当前专利权人: HONEYWELL INTERNATIONAL INC.
- 当前专利权人地址: US NJ Morristown
- 主分类号: G03F7/00
- IPC分类号: G03F7/00
摘要:
Bottom antireflective coating (BARC) that exhibit enhanced wet strip rates, BARC compositions for fabricating such BARCs, and methods for manufacturing such BARC compositions are provided. According to one exemplary embodiment, a bottom antireflective coating (BARC) composition comprises an inorganic-based compound, an absorbing material, and a wet strip-rate modifier combination. The wet strip-rate modifier composition comprises a combination of a short chain linear alcohol and dipropylene glycol (DPG), a combination of the short chain linear alcohol and tetraethylene glycol (TEG), a combination of DPG and TEG, or a combination of the short chain linear alcohol, DPG, and TEG.
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