发明申请
- 专利标题: METHOD FOR DEPOSITING FILM AND FILM DEPOSITION APPARATUS
- 专利标题(中): 沉积膜和薄膜沉积装置的方法
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申请号: US12568672申请日: 2009-09-29
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公开(公告)号: US20100078113A1公开(公告)日: 2010-04-01
- 发明人: Tomokazu Sushihara , Nobutaka Ukigaya
- 申请人: Tomokazu Sushihara , Nobutaka Ukigaya
- 申请人地址: JP Tokyo
- 专利权人: CANON KABUSHIKI KAISHA
- 当前专利权人: CANON KABUSHIKI KAISHA
- 当前专利权人地址: JP Tokyo
- 优先权: JP2008-251997 20080930; JP2009-207019 20090908
- 主分类号: B32B37/16
- IPC分类号: B32B37/16
摘要:
A method for depositing a film includes preparing a deposition material that is purified by sublimation, solidifying the purified deposition material in an environment having a reduced water content, conveying the solidified deposition material into a film deposition chamber through an environment having a reduced water content, and depositing a film of the solidified deposition material onto a substrate in the film deposition chamber.
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