Invention Application
- Patent Title: Film grain simulation method
- Patent Title (中): 电影纹理模拟方法
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Application No.: US12589217Application Date: 2009-10-20
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Publication No.: US20100080455A1Publication Date: 2010-04-01
- Inventor: Cristina Gomila , Joan Llach , Jeffrey Allen Cooper
- Applicant: Cristina Gomila , Joan Llach , Jeffrey Allen Cooper
- Assignee: Thomson Licensing
- Current Assignee: Thomson Licensing
- Main IPC: G06K9/00
- IPC: G06K9/00 ; G06K9/40

Abstract:
Briefly, in accordance with a preferred embodiment of the present principles, simulation of a block of film grain for addition to a block of an image occurs by first establishing at least one image parameter in accordance with at least one attribute of the block. Thereafter, a block of film grain is established in accordance with the image parameter. Deblocking filtering can be applied to the film grain block.
Public/Granted literature
- US08447127B2 Film grain simulation method Public/Granted day:2013-05-21
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