发明申请
- 专利标题: METHOD AND APPARATUS FOR APPLYING A SHEET TO A SUBSTRATE
- 专利标题(中): 用于将基片应用于基板的方法和装置
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申请号: US12517251申请日: 2007-12-03
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公开(公告)号: US20100083855A1公开(公告)日: 2010-04-08
- 发明人: Marcus Antonius Verschuuren , Mischa Megens
- 申请人: Marcus Antonius Verschuuren , Mischa Megens
- 申请人地址: NL EINDHOVEN
- 专利权人: KONINKLIJKE PHILIPS ELECTRONICS N.V.
- 当前专利权人: KONINKLIJKE PHILIPS ELECTRONICS N.V.
- 当前专利权人地址: NL EINDHOVEN
- 优先权: EP06125296.1 20061204
- 国际申请: PCT/IB07/54888 WO 20071203
- 主分类号: B41F31/00
- IPC分类号: B41F31/00
摘要:
The invention provides a method and apparatus for laminating a sheet to a substrate in a stress free and distortion-less manner. The method comprises providing the sheet and substrate such that an attractive force between them exists that is capable of bringing the sheet and surface together at least when their distance is shorter than a critical distance. The method creates these conditions by locally making an initial contact between the sheet and substrate such that at a contact front, being the boundary between areas where the substrate and sheet are in contact and those where they are not in contact, these conditions exist. In a further step the sheet and substrate are allowed to gradually make contact such that the contact front advances along either of the substrate or sheet surface therewith increasing the contacting area between the substrate and the sheet. The method is advantages when used during imprint lithography or embossing processes or other processes where feature patterns need to be transferred from the substrate to the surface or vice versa.
公开/授权文献
- US09440254B2 Method and apparatus for applying a sheet to a substrate 公开/授权日:2016-09-13
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