发明申请
- 专利标题: SPIN TRANSISTOR USING DOUBLE CARRIER SUPPLY LAYER STRUCTURE
- 专利标题(中): 使用双载波供电层结构的旋转晶体管
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申请号: US12342426申请日: 2008-12-23
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公开(公告)号: US20100084633A1公开(公告)日: 2010-04-08
- 发明人: Hyung Jun Kim , Hyun Cheol Koo , Joon Yeon Chang , Suk Hee Han , Kyung Ho Kim
- 申请人: Hyung Jun Kim , Hyun Cheol Koo , Joon Yeon Chang , Suk Hee Han , Kyung Ho Kim
- 优先权: KR10-2008-0096896 20081002
- 主分类号: H01L29/66
- IPC分类号: H01L29/66
摘要:
A spin transistor includes a semiconductor substrate including a channel layer having a 2-dimensional electron gas structure and upper and lower cladding layers disposed respectively in upper and lower sides of the channel layer; ferromagnetic source and drain electrodes formed on the semiconductor substrate and disposed spaced apart from each other; a gate electrode disposed between the source electrode and the drain electrode and having a gate voltage applied thereto in order to control the spin of electrons passed through the channel layer; a first carrier supply layer disposed between the lower cladding layer and the channel layer to supply carriers to the channel layer; and a second carrier supply layer disposed between the upper cladding layer and the channel layer to supply carriers to the channel layer.
公开/授权文献
- US08058676B2 Spin transistor using double carrier supply layer structure 公开/授权日:2011-11-15
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