发明申请
- 专利标题: SOURCE MODULE, RADIATION SOURCE AND LITHOGRAPHIC APPARATUS
- 专利标题(中): 源模块,辐射源和平面设备
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申请号: US12566060申请日: 2009-09-24
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公开(公告)号: US20100085547A1公开(公告)日: 2010-04-08
- 发明人: Dzmitry Labetski , Vadim Yevgenyevich Banine , Erik Roelof Loopstra , Johannes Hubertus Josephina Moors , Gerardus Hubertus Petrus Maria Swinkels
- 申请人: Dzmitry Labetski , Vadim Yevgenyevich Banine , Erik Roelof Loopstra , Johannes Hubertus Josephina Moors , Gerardus Hubertus Petrus Maria Swinkels
- 申请人地址: NL Veldhoven
- 专利权人: ASML NETHERLANDS B.V.
- 当前专利权人: ASML NETHERLANDS B.V.
- 当前专利权人地址: NL Veldhoven
- 主分类号: B41F3/30
- IPC分类号: B41F3/30 ; A61N5/06
摘要:
A radiation source is configured to generate extreme ultraviolet radiation. The radiation source includes a fuel supply configured to supply a fuel to a plasma formation site; a laser configured to emit a beam of radiation to the plasma formation site so that a plasma that emits extreme ultraviolet radiation is generated when the beam of radiation impacts the fuel; a fuel particulate interceptor constructed and arranged to shield at least part of the radiation source from fuel particulates that are emitted by the plasma, the fuel particulate interceptor comprising a first portion and a second portion, the second portion being positioned closer to the plasma formation site than the first portion, and the first portion being rotatable; and a fuel particulate remover constructed and arranged to remove fuel particulates from a surface of the fuel particulate interceptor and to direct the fuel particulates towards a collection location.
公开/授权文献
- US08405055B2 Source module, radiation source and lithographic apparatus 公开/授权日:2013-03-26
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