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公开(公告)号：US09310689B2
公开(公告)日：2016-04-12
申请号：US14241378
申请日：2012-07-31
CPC分类号： G03F7/70033 , H05G2/003 , H05G2/005 , H05G2/006
摘要： Methods and apparatus are provided for promoting the coalescence of fuel droplets in a stream generated by a radiation source droplet stream generator for use in lithographic apparatus. Various examples are described in which a modulating voltage source is applied to the emitter so that the electrical characteristics of the droplets may be controlled. This results in acceleration and deceleration of droplets in the stream which causes them to merge and promotes coalescence.
摘要翻译： 提供了用于促进由用于光刻设备的辐射源液滴发生器产生的流中的燃料液滴聚结的方法和装置。 描述了各种示例，其中将调制电压源施加到发射器，使得可以控制液滴的电特性。 这导致流中液滴的加速和减速，这导致它们合并并促进聚结。
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2.发明授权公开(公告)号：US09091944B2
公开(公告)日：2015-07-28
申请号：US13497741
申请日：2010-09-24
申请人： Erik Roelof Loopstra , Vadim Yevgenyevich Banine , Gerardus Hubertus Petrus Maria Swinkels , Sven Pekelder , Dzmitry Labetski , Uwe Bruno Heini Stamm , William N. Partlo
发明人： Erik Roelof Loopstra , Vadim Yevgenyevich Banine , Gerardus Hubertus Petrus Maria Swinkels , Sven Pekelder , Dzmitry Labetski , Uwe Bruno Heini Stamm , William N. Partlo
CPC分类号： G03F7/70933 , G03F7/70033 , G03F7/70175 , G03F7/70808 , G03F7/70908 , G03F7/70916 , G03F7/70925 , H05G2/003 , H05G2/005
摘要： An EUV lithographic apparatus includes a source collector apparatus in which the extreme ultraviolet radiation is generated by exciting a fuel to provide a plasma emitting the radiation. The source collector apparatus includes a chamber in fluid communication with a guide way external to the chamber. A pump for circulating buffer gas is part of the guide way, and provides a closed loop buffer gas flow. The gas flowing through the guide way traverses a gas decomposer wherein a compound of fuel material and buffer gas material is decomposed, so that decomposed buffer gas material can be fed back into the closed loop flow path.
摘要翻译： EUV光刻设备包括源极收集器装置，其中通过激发燃料产生极紫外辐射以提供发射辐射的等离子体。 源极收集器装置包括与腔室外部的引导方式流体连通的腔室。 用于循环缓冲气体的泵是引导方式的一部分，并提供闭环缓冲气体流。 流过引导方式的气体穿过气体分解器，其中燃料和缓冲气体材料的化合物被分解，使得分解的缓冲气体材料可以反馈回闭环流动路径。
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3.发明申请公开(公告)号：US20120182536A1
公开(公告)日：2012-07-19
申请号：US13497741
申请日：2010-09-24
申请人： Erik Roelof Loopstra , Vadim Yevgenyevich Banine , Gerardus Hubertus Petrus Maria Swinkels , Sven Pekelder , Dzmitry Labetski , Uwe Bruno Heini Stamm , William N. Partlo
发明人： Erik Roelof Loopstra , Vadim Yevgenyevich Banine , Gerardus Hubertus Petrus Maria Swinkels , Sven Pekelder , Dzmitry Labetski , Uwe Bruno Heini Stamm , William N. Partlo
CPC分类号： G03F7/70933 , G03F7/70033 , G03F7/70175 , G03F7/70808 , G03F7/70908 , G03F7/70916 , G03F7/70925 , H05G2/003 , H05G2/005
摘要： An EUV lithographic apparatus includes a source collector apparatus in which the extreme ultraviolet radiation is generated by exciting a fuel to provide a plasma emitting the radiation. The source collector apparatus includes a chamber in fluid communication with a guide way external to the chamber. A pump for circulating buffer gas is part of the guide way, and provides a closed loop buffer gas flow. The gas flowing through the guide way traverses a gas decomposer wherein a compound of fuel material and buffer gas material is decomposed, so that decomposed buffer gas material can be fed back into the closed loop flow path.
摘要翻译： EUV光刻设备包括源极收集器装置，其中通过激发燃料产生极紫外辐射以提供发射辐射的等离子体。 源极收集器装置包括与腔室外部的引导方式流体连通的腔室。 用于循环缓冲气体的泵是引导方式的一部分，并提供闭环缓冲气体流。 流过引导方式的气体穿过气体分解器，其中燃料和缓冲气体材料的化合物被分解，使得分解的缓冲气体材料可以反馈回闭环流动路径。
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4.发明申请公开(公告)号：US20100231130A1
公开(公告)日：2010-09-16
申请号：US12712545
申请日：2010-02-25
申请人： Dzmitry LABETSKI , Erik Roelof Loopstra , Gerardus Hubertus Petrus Maria Swinkels , Tom Van Zutphen
发明人： Dzmitry LABETSKI , Erik Roelof Loopstra , Gerardus Hubertus Petrus Maria Swinkels , Tom Van Zutphen
CPC分类号： H05G2/003 , G03F7/70033 , H05G2/005
摘要： A plasma radiation source includes a vessel configured to catch a source material transmitted along a trajectory, and a decelerator configured to reduce a speed of the source material in a section of the trajectory downstream of a plasma initiation site.
摘要翻译： 等离子体辐射源包括构造成捕获沿着轨迹传输的源材料的容器，以及减速器，其构造成在等离子体起始位置下游的轨迹的一部分中降低源材料的速度。
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公开(公告)号：US09113539B2
公开(公告)日：2015-08-18
申请号：US13597754
申请日：2012-08-29
CPC分类号： H05G2/005 , G03F7/70033 , G03F7/70883 , G03F7/70916 , H05G2/006 , H05G2/008
摘要： A radiation source comprises a reservoir, a nozzle, a laser, and a positive lens. The reservoir is configured to retain a volume of fuel. The nozzle, in fluid connection with the reservoir, is configured to direct a stream of fuel along a trajectory towards a plasma formation location. The laser configured to direct laser radiation at the stream at the plasma formation location to generate, in use, a radiation generating plasma. The positive lens arrangement configured to focus an at least potential spread of trajectories of the stream of fuel toward the plasma formation location, the lens comprising an electric field generating element and/or a magnetic field generating element.
摘要翻译： 辐射源包括储存器，喷嘴，激光器和正透镜。 储存器构造成保持一定体积的燃料。 与储存器流体连接的喷嘴被配置成将沿着轨迹的燃料流引导到等离子体形成位置。 激光器被配置为在等离子体形成位置处的流处引导激光辐射，以在使用中产生辐射产生等离子体。 正透镜装置被配置为将燃料流的轨迹的至少势能扩散聚焦到等离子体形成位置，该透镜包括电场产生元件和/或磁场产生元件。
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6.发明授权Collector mirror assembly and method for producing extreme ultraviolet radiation 有权收集器镜组件和产生极紫外辐射的方法公开(公告)号：US09013679B2
公开(公告)日：2015-04-21
申请号：US13641069
申请日：2011-03-18
CPC分类号： G02B5/08 , G03F7/20 , G03F7/70033 , G03F7/70175 , G03F7/70808 , G03F7/70841 , G03F7/70908 , G03F7/70916 , G03F7/70933 , G21K5/04
摘要： A collector mirror assembly includes a collector mirror that includes a reflective surface and a hole having an edge. The hole extends through the reflective surface. The assembly also includes a tubular body having an inner surface and an outer surface. The tubular body is constructed and arranged to guide a gas flow in a direction substantially transverse to the reflective surface. The outer surface of the tubular body and the edge of the hole form an opening arranged to guide a further gas flow that diverges with respect the gas flow substantially transverse to the reflective surface.
摘要翻译： 收集器反射镜组件包括收集器反射镜，其包括反射表面和具有边缘的孔。 孔延伸穿过反射表面。 组件还包括具有内表面和外表面的管状体。 管状体被构造和布置成沿着基本横向于反射表面的方向引导气流。 管状体的外表面和孔的边缘形成开口，该开口布置成引导相对于基本上横向于反射表面的气流发散的另外的气流。
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公开(公告)号：US08755032B2
公开(公告)日：2014-06-17
申请号：US13063139
申请日：2009-07-21
申请人： Andrei Mikhailovich Yakunin , Vadim Yevgenyevich Banine , Vladimir Vitalevich Ivanov , Erik Roelof Loopstra , Vladimir Mihailovitch Krivtsun , Gerardus Hubertus Petrus Maria Swinkels , Dzmitry Labetski
发明人： Andrei Mikhailovich Yakunin , Vadim Yevgenyevich Banine , Vladimir Vitalevich Ivanov , Erik Roelof Loopstra , Vladimir Mihailovitch Krivtsun , Gerardus Hubertus Petrus Maria Swinkels , Dzmitry Labetski
CPC分类号： G03F7/70933 , G03F7/70033 , G03F7/70916 , G03F7/70983 , H05G2/003
摘要： A radiation source is configured to generate extreme ultraviolet radiation. The radiation source includes a plasma formation site located at a position in which a fuel will be contacted by a beam of radiation to form a plasma, an outlet configured to allow gas to exit the radiation source, and a contamination trap at least partially located inside the outlet. The contamination trap is configured to trap debris particles that are generated with the formation of the plasma.
摘要翻译： 辐射源被配置成产生极紫外辐射。 辐射源包括位于燃料将被辐射束接触以形成等离子体的位置处的等离子体形成位置，被配置为允许气体离开辐射源的出口以及至少部分地位于内部的污染阱 出口。 污染阱被配置成捕集在形成等离子体时产生的碎屑颗粒。
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公开(公告)号：US08220315B2
公开(公告)日：2012-07-17
申请号：US12609835
申请日：2009-10-30
IPC分类号： G01B13/08
CPC分类号： G03B27/52 , G01B13/12 , G03F9/7057
摘要： A gas gauge has a gas delivery tube arranged to determine a distance to an object. The gas delivery tube includes a gas conduit through which a suitable measurement gas is supplied. The measurement gas leaves the gas delivery tube under pressure via an outlet and impinges on the object in an interaction area, wherein a pressure of a recoiled gas is measured by a pressure detector. A gas having a low atomic number may be used. The pressure sensor may include a membrane positioned in the gas delivery tube at least partially enveloping the gas conduit at or near the gas outlet. The pressure sensor may include a membrane disk arranged about the gas conduit. The pressure sensor may include a suitable plurality of pressure elements arranged in a substantially common plane and which may be spaced apart yet enveloping the gas conduit.
摘要翻译： 气量计具有布置成确定到物体的距离的气体输送管。 气体输送管包括供给合适的测量气体的气体导管。 测量气体通过出口在压力下离开气体输送管，并在相互作用区域中撞击物体，其中通过压力检测器测量反冲气体的压力。 可以使用原子序数低的气体。 压力传感器可以包括位于气体输送管中的膜，其至少部分地包围气体出口处或附近的气体导管。 压力传感器可以包括围绕气体管道布置的膜盘。 压力传感器可以包括布置在基本上共同的平面中并且可以间隔开并包封气体管道的合适的多个压力元件。
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公开(公告)号：US08749756B2
公开(公告)日：2014-06-10
申请号：US13361545
申请日：2012-01-30
申请人： Yuri Johannes Gabrial Van De Vijver , Jan Bernard Plechelmus Van Schoot , Gerardus Hubertus Petrus Maria Swinkels , Hendrikus Gijsbertus Schimmel , Dzmitry Labetski , Tjarko Adriaan Rudolf Van Empel
发明人： Yuri Johannes Gabrial Van De Vijver , Jan Bernard Plechelmus Van Schoot , Gerardus Hubertus Petrus Maria Swinkels , Hendrikus Gijsbertus Schimmel , Dzmitry Labetski , Tjarko Adriaan Rudolf Van Empel
CPC分类号： G03F7/70033 , B82Y10/00 , G03F7/70841 , G03F7/70908 , G03F7/70916 , G03F7/70933 , H05G2/003 , H05G2/008
摘要： A lithographic apparatus is arranged to project a pattern from a patterning device onto a substrate is disclosed. The lithographic apparatus includes an illumination system and an outlet connected to a pumping system to pump away gas from between an inner wall and outer wall of the illumination system or, if a radiation source is present, between the inner wall of the illumination system and an inner wall of the radiation source.
摘要翻译： 公开了一种光刻设备，用于将图案从图案形成装置突出到衬底上。 光刻设备包括照明系统和连接到泵送系统的出口，以从照明系统的内壁和外壁之间泵送气体，或者如果存在辐射源，则在照明系统的内壁和 辐射源的内壁。
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公开(公告)号：US20130077070A1
公开(公告)日：2013-03-28
申请号：US13597754
申请日：2012-08-29
CPC分类号： H05G2/005 , G03F7/70033 , G03F7/70883 , G03F7/70916 , H05G2/006 , H05G2/008
摘要： A radiation source comprises a reservoir, a nozzle, a laser, and a positive lens. The reservoir is configured to retain a volume of fuel. The nozzle, in fluid connection with the reservoir, is configured to direct a stream of fuel along a trajectory towards a plasma formation location. The laser configured to direct laser radiation at the stream at the plasma formation location to generate, in use, a radiation generating plasma. The positive lens arrangement configured to focus an at least potential spread of trajectories of the stream of fuel toward the plasma formation location, the lens comprising an electric field generating element and/or a magnetic field generating element.
摘要翻译： 辐射源包括储存器，喷嘴，激光器和正透镜。 储存器构造成保持一定体积的燃料。 与储存器流体连接的喷嘴被配置成将沿着轨迹的燃料流引导到等离子体形成位置。 激光器被配置为在等离子体形成位置处的流处引导激光辐射，以在使用中产生辐射产生等离子体。 正透镜装置被配置为将燃料流的轨迹的至少势能扩散聚焦到等离子体形成位置，该透镜包括电场产生元件和/或磁场产生元件。
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