发明申请
US20100087590A1 EPOXY RESIN COMPOSITION AND CURED ARTICLE THEREOF, SEMICONDUCTOR ENCAPSULATION MATERIAL, NOVEL PHENOL RESIN, AND NOVEL EPOXY RESIN
有权
环氧树脂组合物及其固化物,半导体封装材料,新型酚醛树脂和新型环氧树脂
- 专利标题: EPOXY RESIN COMPOSITION AND CURED ARTICLE THEREOF, SEMICONDUCTOR ENCAPSULATION MATERIAL, NOVEL PHENOL RESIN, AND NOVEL EPOXY RESIN
- 专利标题(中): 环氧树脂组合物及其固化物,半导体封装材料,新型酚醛树脂和新型环氧树脂
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申请号: US12634259申请日: 2009-12-09
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公开(公告)号: US20100087590A1公开(公告)日: 2010-04-08
- 发明人: Ichirou OGURA , Yoshiyuki TAKAHASHI , Yutaka SATO
- 申请人: Ichirou OGURA , Yoshiyuki TAKAHASHI , Yutaka SATO
- 申请人地址: JP Tokyo
- 专利权人: DAINIPPON INK AND CHEMICALS, INC.
- 当前专利权人: DAINIPPON INK AND CHEMICALS, INC.
- 当前专利权人地址: JP Tokyo
- 优先权: JP2005-057393 20050302; JP2005-057394 20050302; JP2005-257056 20050905
- 主分类号: C08L63/00
- IPC分类号: C08L63/00 ; C08G65/38
摘要:
The object of the present invention is to provide an epoxy resin composition capable of realizing low dielectric constant and low dielectric dissipation factor, which is suited for use as a latest current high-frequency type electronic component-related material, without deteriorating heat resistance during the curing reaction. A phenol resin, which has the respective structural units of a phenolic hydroxyl group-containing aromatic hydrocarbon group (P) derived from phenols, an alkoxy group-containing condensed polycyclic aromatic hydrocarbon group (B) derived from methoxynaphthalene and a divalent hydrocarbon group (X) such as methylene and also has a structure represented by -P-B-X- wherein P, B and X are structural sites of these groups in a molecular structure, is used as a curing agent for the epoxy resin, or a phenol resin as an epoxy resin material.
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