发明申请
US20100101949A1 ROTATABLE SPUTTER TARGET BACKING CYLINDER, ROTATABLE SPUTTER TARGET, METHOD OF PRODUCING A ROTATABLE SPUTTER TARGET, AND COATING INSTALLATION
审中-公开
可旋转飞溅器目标后支撑筒，可旋转飞溅器目标，生产可旋转飞溅器目标的方法和涂层安装
- 专利标题： ROTATABLE SPUTTER TARGET BACKING CYLINDER, ROTATABLE SPUTTER TARGET, METHOD OF PRODUCING A ROTATABLE SPUTTER TARGET, AND COATING INSTALLATION
- 专利标题（中）： 可旋转飞溅器目标后支撑筒，可旋转飞溅器目标，生产可旋转飞溅器目标的方法和涂层安装
-
申请号： US12605172申请日： 2009-10-23
-
公开(公告)号： US20100101949A1公开(公告)日： 2010-04-29
- 发明人: Roland TRASSL , Michael SCHAEFER , Jian LIU
- 申请人： Roland TRASSL , Michael SCHAEFER , Jian LIU
- 申请人地址： US CA Santa Clara
- 专利权人： APPLIED MATERIALS, INC.
- 当前专利权人： APPLIED MATERIALS, INC.
- 当前专利权人地址： US CA Santa Clara
- 优先权： EP08167571 20081024
- 主分类号： C23C14/34
- IPC分类号： C23C14/34 ; B23P11/00
摘要：
A rotatable target device for sputtering installations, the rotatable target device including: a rotatable target base adapted for holding a solid target cylinder, the solid target cylinder having an inner axial face, an outer axial face and at least one front face connecting the inner axial face with the outer axial face; wherein the rotatable target base comprises a flexible element, a first face adapted to the shape of the inner axial face of the solid target cylinder and a second face adapted to hold the flexible element outside of the solid target cylinder.
信息查询
IPC分类:
