发明申请
- 专利标题： RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN
- 专利标题（中）： 耐蚀组合物和形成耐力图案的方法
-
申请号： US11997527申请日： 2006-07-10
-
公开(公告)号： US20100104972A1公开(公告)日： 2010-04-29
- 发明人: Ryoji Watanabe , Takehiro Seshimo , Takeshi Iwai
- 申请人： Ryoji Watanabe , Takehiro Seshimo , Takeshi Iwai
- 申请人地址： JP Kawasaki-shi
- 专利权人： TOKYO OHKA KOGYO CO., LTD.
- 当前专利权人： TOKYO OHKA KOGYO CO., LTD.
- 当前专利权人地址： JP Kawasaki-shi
- 优先权： JP2005-225805 20050803
- 国际申请： PCT/JP2006/313710 WO 20060710
- 主分类号： G03F7/20
- IPC分类号： G03F7/20 ; G03F7/004
摘要：
A resist composition of the present invention is obtained by dissolving a resin component (A) that displays changed alkali solubility under action of acid and an acid generator component (B) that generates acid upon exposure in an organic solvent (S), wherein the organic solvent (S) includes an aromatic organic solvent (S1). According to the present invention, a resist composition and a method of forming a resist pattern, in which the level of LWR is reduced, can be provided.
公开/授权文献
- US08007981B2 Resist composition and method of forming resist pattern 公开/授权日：2011-08-30
信息查询
IPC分类:
