公开(公告)号：US12129335B2

公开(公告)日：2024-10-29

申请号：US17457107

申请日：2021-12-01

申请人： TOKYO OHKA KOGYO CO., LTD.

发明人： Ryutaro Sugawara

IPC分类号： C08G61/12 ,  C07D251/70

CPC分类号： C08G61/122 ,  C07D251/70

摘要： A curable composition that gives a cured product exhibiting a high refractive index and a surface without defects such as roughness or cracks, a cured product of the composition, and a compound that may be blended to the composition. In a curable composition including a triazine compound having three aromatic-ring-containing groups each bonded to the triazine ring via an amino group, an aromatic-ring-containing group having a specific structure having a radically polymerizable group-containing group or a cationically polymerizable group-containing group is used as at least one of the three aromatic-ring-containing groups bonded to the triazine ring in the triazine compound mentioned above.

公开(公告)号：US20240336882A1

公开(公告)日：2024-10-10

申请号：US18681554

申请日：2022-08-25

申请人： TOKYO OHKA KOGYO CO., LTD.

发明人： Takashi KAMIZONO ,  Takashi FUJIMOTO ,  Takafumi AKABANE ,  Taku SATOH ,  Hiroyuki MORIGUCHI

IPC分类号： C12M3/06 ,  C12M1/00 ,  C12M1/12

CPC分类号： C12M23/16 ,  C12M25/06 ,  C12M29/04

摘要： A chip for cell culture, including a laminate having a flow path structure inside, in which respective members constituting respective layers of the laminate are adhered by adhesive layers, and the adhesive layer includes a first adhesive layer formed of an adhesive that contains a polyester-based resin having a glass transition temperature of 37° C. or higher and 120° C. or lower.

公开(公告)号：US20240329530A1

公开(公告)日：2024-10-03

申请号：US18568489

申请日：2022-06-24

申请人： TOKYO OHKA KOGYO CO., LTD.

发明人： TAKASHI NAGAMINE ,  TAKATOSHI INARI

IPC分类号： G03F7/039 ,  G03F7/004 ,  G03F7/038

CPC分类号： G03F7/039 ,  G03F7/0045 ,  G03F7/038

摘要： A resist composition including a resin component (A1), a compound (B0) represented by General Formula (b0), and a photodegradable base (D0) that has a carboxylic acid with a pKa of 0.3 to 2.5 as a generated acid. In formula (b0), Rb11 to Rb13 represent a halogen atom, Rb21 to Rb23 each independently represents a hydrogen atom, mb1, nb1, and ob1 represent an integer of 2 to 5, mb2 represents an integer of 5-mb1, nb2 represents an integer of 5-nb1, ob2 represents an integer of 5-ob1, R101 represents a cyclic group, R102 represents a fluorinated alkyl group or a fluorine atom, Y101 represents a divalent linking group having an oxygen atom or a single bond, and V101 represents a single bond, an alkylene group, or a fluorinated alkylene group

公开(公告)号：US12099298B2

公开(公告)日：2024-09-24

申请号：US17448838

申请日：2021-09-24

申请人： TOKYO OHKA KOGYO CO., LTD.

发明人： Masaru Takeshita ,  Kazufumi Sato ,  Masahito Yahagi

IPC分类号： G03F7/075 ,  G03F7/004 ,  G03F7/038 ,  G03F7/039 ,  G03F7/30

CPC分类号： G03F7/0757 ,  G03F7/0045 ,  G03F7/0382 ,  G03F7/0392 ,  G03F7/0758 ,  G03F7/30

摘要： A resist composition containing a silicon-containing resin, an acid generator component which generates an acid upon exposure, and a photodecomposable base which controls diffusion of the acid generated from the acid generator component upon exposure, in which the silicon content proportion in the silicon-containing resin is in a range of 20% to 25% with respect to a total amount of all atoms constituting the silicon-containing resin.

公开(公告)号：US20240302741A1

公开(公告)日：2024-09-12

申请号：US18568071

申请日：2022-06-10

申请人： TOKYO OHKA KOGYO CO., LTD.

发明人： Shuichi Ishii ,  Hiroki Kato ,  KhanhTin Nguyen ,  Takuya Ikeda ,  Koshi Onishi ,  Rin Odashima ,  Tetsuo Fujinami ,  Seiji Todoroki ,  Ryo Kawatani

IPC分类号： G03F7/004

CPC分类号： G03F7/0045

摘要： A resist composition that contains a resin component having a constitutional unit containing an acid-dissociable group represented by General Formula (a01-r) below and contains an acid generator component containing a compound represented by General Formula (b0) below. In General Formula (a01-r), Ra01 and Ra02 represent a saturated aliphatic hydrocarbon group, Ra01 and Ra02 may be bonded to each other to form an alicyclic group. Ra03 to Ra05 represent an aliphatic hydrocarbon group and two or more of Ra03 to Ra05 may be bonded to each other to form an alicyclic group. In General Formula (b-0), X0 represents an iodine atom, Rm represents a hydroxy group, nb1 represents an integer in a range of 1 to 5, nb2 represents an integer in a range of 0 to 4, 1≤nb1+nb2≤5, Yb0 represents a divalent linking group, Vb0 represents an alkylene group, R0 represents a fluorinated alkyl group having 1 to 5 carbon atoms, and Mm+ represents an m-valent organic cation

公开(公告)号：US20240271061A1

公开(公告)日：2024-08-15

申请号：US18433953

申请日：2024-02-06

申请人： TOKYO OHKA KOGYO CO., LTD.

发明人： Takumi NAMIKI ,  Jun IIOKA

IPC分类号： C11D3/24 ,  C11D3/34 ,  C11D17/00

CPC分类号： C11D3/245 ,  C11D3/3409 ,  C11D17/0008 ,  C11D2111/16

摘要： An aqueous cleaning liquid containing hydrofluoric acid and an aliphatic sulfonic acid, where the aqueous cleaning liquid is used in a case of cleaning a substrate having cobalt in a surface layer.

公开(公告)号：US20240271060A1

公开(公告)日：2024-08-15

申请号：US18433969

申请日：2024-02-06

申请人： TOKYO OHKA KOGYO CO., LTD.

发明人： Takumi NAMIKI ,  Jun IIOKA

IPC分类号： C11D3/20 ,  C11D3/00 ,  C11D3/04 ,  C11D3/30

CPC分类号： C11D3/2072 ,  C11D3/0073 ,  C11D3/042 ,  C11D3/2082 ,  C11D3/30 ,  C11D2111/22

摘要： There is provided an aqueous cleaning liquid containing hydrofluoric acid and at least one kind of chelating compound selected from the group consisting of a β-diketone compound and a compound containing a total of two or more carboxy groups or hydroxyl groups in a molecule, where the aqueous cleaning liquid is used in a case of cleaning a substrate that contains aluminum oxide in a surface layer.

公开(公告)号：US20240248403A1

公开(公告)日：2024-07-25

申请号：US18563358

申请日：2022-06-06

申请人： TOKYO OHKA KOGYO CO., LTD.

发明人： Tetsuya Matsushita ,  Koshi Onishi ,  Shuichi Ishii ,  Junichi Miyakawa

IPC分类号： G03F7/039 ,  G03F7/004 ,  G03F7/038 ,  G03F7/20

CPC分类号： G03F7/0397 ,  G03F7/0045 ,  G03F7/0382 ,  G03F7/0388 ,  G03F7/2004

摘要： A resist composition including a resin component (A1) which has a constitutional unit (a0) containing a photodegradable base that is decomposed upon light exposure and loses acid diffusion controllability, and an acid generator component (B) which contains a compound (BO) represented by General Formula (b0) in which X0 represents a bromine atom or an iodine atom, Rm represents a hydroxy group, an alkyl group, a fluorine atom, or a chlorine atom, nb1 represents an integer of 1 to 5, and nb2 represents an integer of 0 to 4, where 1≤nb1+nb2≤5 is satisfied, Yb0 represents a divalent linking group or a single bond, Vb0 represents a single bond, an alkylene group, or a fluorinated alkylene group, R0 represents a hydrogen atom, a fluorinated alkyl group having 1 to 5 carbon atoms, or a fluorine atom, Mm+ represents an m-valent organic cation, and m represents an integer of 1 or greater

公开(公告)号：US20240210825A1

公开(公告)日：2024-06-27

申请号：US18554179

申请日：2022-04-21

申请人： TOKYO OHKA KOGYO CO., LTD.

发明人： KhanhTin Nguyen ,  Tatsuya Fujii ,  Mari Murata

IPC分类号： G03F7/004

CPC分类号： G03F7/0045

摘要： A resist composition containing a base material component (A) and a compound (B0) represented by General Formula (b0), in which Rb0 represents a condensed cyclic group containing a condensed ring containing one or more aromatic rings, the condensed cyclic group has, as a substituent, an acid decomposable group that is decomposed under action of acid to form a polar group, Yb0 represents a divalent linking group or a single bond, Vb0 represents a single bond, an alkylene group, or a fluorinated alkylene group, R0 represents a fluorinated alkyl group having 1 to 5 carbon atoms or a fluorine atom, Mm+ represents an m-valent organic cation, and m represents an integer of 1 or more

公开(公告)号：US20240191360A1

公开(公告)日：2024-06-13

申请号：US18527976

申请日：2023-12-04

申请人： TOKYO OHKA KOGYO CO., LTD.

发明人： Kazuhiro TAKAHASHI

IPC分类号： C23F1/30

CPC分类号： C23F1/30

摘要： A chemical solution for removing a precious metal includes a cerium-containing oxidizing agent (A), an acid component (B) that is two or more acid components having different pKa's one another, provided that perchloric acid is excluded, and water.